⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bromide SCHEMBL28423173 | 0.96 | BLM (0.30) | — | |
| Hydrochloric Acid SCHEMBL29161781 | 0.96 | — | — | |
| SCHEMBL5181425 | 0.83 | — | — | |
| SCHEMBL516489 | 0.81 | ALDH1A1 (0.33) | — | |
| SCHEMBL1537877 | 0.79 | — | — | |
| SCHEMBL1537878 | 0.79 | — | — | |
| SCHEMBL9618289 | 0.79 | — | — | |
| Hydrochloric Acid SCHEMBL22575504 | 0.78 | ALDH1A1 (0.32) | — | |
| SCHEMBL516007 | 0.76 | CES1 (0.38) | — | |
| SCHEMBL4625514 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250122316-A1 | CURABLE COMPOSITION AND CURED PRODUCT | DEXERIALS CORPORATION (JP) | 2025-04-17 | — | — | US | disclosed |
| WO-2023282174-A1 | CURABLE COMPOSITION, AND CURED PRODUCT | デクセリアルズ株式会社 | 2023-01-12 | — | — | WO | disclosed |
| CN-113880984-B | Drag reducer and preparation method thereof | 新疆兰德伟业油田服务有限公司 | 2022-10-18 | — | — | CN | disclosed |
| CN-113880984-A | Drag reducer and preparation method thereof | 新疆兰德伟业油田服务有限公司 | 2022-01-04 | — | — | CN | disclosed |
| EP-2738010-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR PRODUCING RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR PRODUCING RELIEF PRINTING PLATE, AND RELIEF PRINTING PLATE | FUJIFILM Corporation (JP) | 2014-06-04 | — | — | EP | disclosed |
| EP-2481583-B1 | Resin composition for laser engraving, relief printing plate precursor for laser engraving, and relief printing plate and process for making the same | FUJIFILM CORP (JP) | 2014-05-28 | — | — | EP | disclosed |
| US-20140130693-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR PRODUCING RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR MAKING RELIEF PRINTING PLATE, AND RELIEF PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2014-05-15 | — | — | US | disclosed |
| US-8710151-B2 | Onium salt-containing polymer | NIPPON SODA CO., LTD. (JP) | 2014-04-29 | — | — | US | disclosed |
| EP-2393666-B1 | RELIEF PRINTING PLATE | FUJIFILM CORP (JP) | 2014-01-15 | — | — | EP | disclosed |
| US-8618208-B2 | Resin composition for laser engraving, relief printing plate precursor for laser engraving and process for producing the same, and relief printing plate and process for making the same | FUJIFILM CORPORATION (JP) | 2013-12-31 | — | — | US | disclosed |
| US-20120024224-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING THE SAME, AND RELIEF PRINTING PLATE AND PROCESS FOR MAKING THE SAME | FUJIFILM CORPORATION (JP) | 2012-02-02 | — | — | US | disclosed |
| US-20110201759-A1 | ONIUM SALT-CONTAINING POLYMER | NIPPON SODA CO., LTD. (JP) | 2011-08-18 | — | — | US | disclosed |
| US-20110076454-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING STARTING PLATE FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, AND RELIEF PRINTING PLATE AND PROCESS FOR MAKING SAME | FUJIFILM CORPORATION (JP) | 2011-03-31 | — | — | US | disclosed |
| EP-2301750-A1 | Resin composition for laser engraving, relief printing starting plate for laser engraving and process for producing the same | Fujifilm Corporation (JP) | 2011-03-30 | — | — | EP | disclosed |
| EP-2226343-A1 | ONIUM SALT-CONTAINING POLYMER | Nippon Soda Co., Ltd. (JP) | 2010-09-08 | — | — | EP | disclosed |
| WO-2010090345-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, RELIEF PRINTING PLATE AND METHOD FOR PRODUCING RELIEF PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2010-08-12 | — | — | WO | disclosed |
| US-7161039-B2 | Method and device for producing ethylamine and butylamine | BASF AKTIENGESELLSCHAFT (DE) | 2007-01-09 | — | — | US | disclosed |
| US-20050124832-A1 | Method and device for producing ethylamine and butylamine | BASF AKTIENGESELLSCHAFT (DE) | 2005-06-09 | — | — | US | disclosed |
| EP-0206621-B1 | PROCESS FOR DISPROPORTIONATING SILANES | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1989-11-15 | — | — | EP | disclosed |
| EP-0206621-A1 | Process for disproportionating silanes | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1986-12-30 | — | — | EP | disclosed |