⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4353597 | 0.77 | TSHR (0.30) | — | |
| SCHEMBL262095 | 0.73 | — | — | |
| SCHEMBL11808752 | 0.72 | — | — | |
| SCHEMBL23792347 | 0.71 | — | — | |
| SCHEMBL10234453 | 0.69 | — | — | |
| SCHEMBL84208 | 0.69 | — | — | |
| SCHEMBL261991 | 0.69 | — | — | |
| SCHEMBL76816 | 0.67 | ALDH1A1 (0.43) | — | |
| SCHEMBL6903736 | 0.67 | — | — | |
| SCHEMBL4374607 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0908473-B1 | Styrene polymers, chemically-amplified positive resist compositions, their preparation and use in a patterning process | SHINETSU CHEMICAL CO (JP) | 2006-02-01 | — | — | EP | claimed |
| WO-2022149595-A1 | FLUORORUBBER COMPOSITION AND SEAL MEMBER | NOK株式会社 | 2022-07-14 | — | — | WO | disclosed |
| WO-2021065199-A1 | FLUORORUBBER COMPOSITION AND SEAL MATERIAL | ユニマテック株式会社 | 2021-04-08 | — | — | WO | disclosed |
| EP-1112995-B1 | ALICYCLIC COMPOUNDS AND CURABLE RESIN COMPOSITION | NISSAN CHEMICAL IND LTD (JP) | 2007-04-11 | — | — | EP | disclosed |
| EP-0908473-B1 | Styrene polymers, chemically-amplified positive resist compositions, their preparation and use in a patterning process | SHINETSU CHEMICAL CO (JP) | 2006-02-01 | — | — | EP | disclosed |
| US-6613844-B2 | Polyhydroxystyrene type polymer containing acid labile groups, endcapped and optionally crosslinked; improved alkali dissolution contrast, sensitivity, resolution, plasma etching resistance, heat resistance, and reproducibility | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-09-02 | — | — | US | disclosed |
| US-20030013832-A1 | Novel styrene polymer, chemically amplified positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-01-16 | — | — | US | disclosed |
| US-6384169-B1 | POLYHYDROXYSTYRENE WITH ACID LABILE GROUP, MODIFIED AT ENDS WITH ALKYLS, ESTERS OR ALCOHOLS; INCREASED DISSOLUTION RATE, HIGH SENSITIVITY AND RESOLUTION; RESIST PATTERNS HAVE PLASMA ETCHING RESISTANCE, HEAT RESISTANCE, REPRODUCIBILITY | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-05-07 | — | — | US | disclosed |
| US-6365771-B1 | CURABLE VINYL ETHER OR METHACRYLATE DERIVATIVES OF 4,7 METHANOINDENE OR INDANE; PHOTORESISTS, OPTICS, AND COATINGS | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2002-04-02 | — | — | US | disclosed |
| EP-1112995-A1 | ALICYCLIC COMPOUNDS AND CURABLE RESIN COMPOSITION | Nissan Chemical Industries, Ltd. (JP) | 2001-07-04 | — | — | EP | disclosed |
| EP-0907666-A1 | PARTICLES COMPRISING AMPHIPHILIC COPOLYMERS, HAVING A CROSS-LINKED SHELL DOMAIN AND AN INTERIOR CORE DOMAIN, USEFUL FOR PHARMACEUTICAL AND OTHER APPLICATIONS | G.D. Searle & Co. (US) | 1999-04-14 | — | — | EP | disclosed |
| WO-1997049736-A2 | PARTICLES COMPRISING AMPHIPHILIC COPOLYMERS, HAVING A CROSS-LINKED SHELL DOMAIN AND AN INTERIOR CORE DOMAIN, USEFUL FOR PHARMACEUTICAL AND OTHER APPLICATIONS | G.D. SEARLE AND CO. (US) | 1997-12-31 | — | — | WO | disclosed |
| WO-1997049387-A1 | PARTICLES COMPRISING AMPHIPHILIC COPOLYMERS, HAVING A CROSS-LINKED SHELL DOMAIN AND AN INTERIOR CORE DOMAIN, USEFUL FOR PHARMACEUTICAL AND OTHER APPLICATIONS | G.D. SEARLE AND CO. (US) | 1997-12-31 | — | — | WO | disclosed |
| US-4777214-A | SOLVENT RESISTANCE, HEAT RESISTANCE, DIELECTRICS | RAYCHEM CORPORATION (US) | 1988-10-11 | — | — | US | disclosed |
| EP-0130052-B1 | FLUORINATED VINYL ETHER COPOLYMERS HAVING LOW GLASS TRANSITION TEMPERATURES | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-09-02 | — | — | EP | disclosed |
| EP-0192397-A1 | Blends of poly(arylene ether ketones) and tetrafluoroethylene copolymers | RAYCHEM CORPORATION (a Delaware corporation) (US) | 1986-08-27 | — | — | EP | disclosed |
| EP-0130052-A1 | Fluorinated vinyl ether copolymers having low glass transition temperatures | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-01-02 | — | — | EP | disclosed |
| US-4237258-A | CONTAINING MINOR AMOUNTS OF ETHYLENICALLY UNSATURATED MONOMERS; MOLDING MATERIAL | MONTEDISON S.P.A. (IT) | 1980-12-02 | — | — | US | disclosed |
| US-4094833-A | Vinylic group containing dextran derivative gel in particle form for separation purposes | PHARMACIA FINE CHEMICALS AB (SW) | 1978-06-13 | — | — | US | disclosed |
| US-4094832-A | Vinylic group containing dextran derivative gel for use in electrophoretic separation processes | PHARMACIA FINE CHEMICALS AB (SW) | 1978-06-13 | — | — | US | disclosed |