Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.37 |
| ▸ | NOS3 | P29474 | 1/20 | 0.33 |
| ▸ | NOS1 | P29475 | 1/20 | 0.33 |
| ▸ | NOS2 | P35228 | 1/20 | 0.33 |
| ▸ | CD81 | P60033 | 1/20 | 0.33 |
| ▸ | GRIK1 | P39086 | 1/20 | 0.32 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.32 |
| ▸ | RAB9A | P51151 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | PPARG | P37231 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15535508 | 0.84 | CD81 (0.39) | NOS3NOS1NOS2CD81PPARG | |
| SCHEMBL3166408 | 0.83 | TSHR (0.33) | TSHRNOS3NOS1NOS2CD81 | |
| SCHEMBL6851328 | 0.82 | CD81 (0.38) | TSHRNOS3NOS1NOS2CD81 | |
| SCHEMBL6851323 | 0.82 | CD81 (0.38) | TSHRNOS3NOS1NOS2CD81 | |
| SCHEMBL550947 | 0.81 | TSHR (0.35) | TSHRGRIK1ALDH1A1 | |
| SCHEMBL28995142 | 0.81 | USP2 (0.42) | NOS3NOS1NOS2CD81ALOX15 | |
| SCHEMBL8500713 | 0.81 | TSHR (0.34) | TSHRCD81ALOX15 | |
| SCHEMBL4923413 | 0.80 | TSHR (0.32) | TSHR | |
| SCHEMBL30729595 | 0.80 | CD81 (0.37) | CD81PPARG | |
| SCHEMBL2965591 | 0.79 | CD81 (0.32) | CD81ALOX15ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1476509-B1 | SELF-POLISHING ANTIFOULING PAINT | JOTUN AS (NO) | 2007-04-11 | — | — | EP | claimed |
| US-9733564-B2 | Copolymers for lithography and method for producing same, resist composition, method for producing substrate with pattern formed thereupon, method for evaluating copolymers, and method for analyzing copolymer compositions | MITSUBISHI CHEMICAL CORPORATION (JP) | 2017-08-15 | — | — | US | disclosed |
| US-20130224654-A1 | COPOLYMERS FOR LITHOGRAPHY AND METHOD FOR PRODUCING SAME, RESIST COMPOSITION, METHOD FOR PRODUCING SUBSTRATE WITH PATTERN FORMED THEREUPON, METHOD FOR EVALUATING COPOLYMERS, AND METHOD FOR ANALYZING COPOLYMER COMPOSITIONS | MITSUBISHI RAYON CO., LTD. (JP) | 2013-08-29 | — | — | US | disclosed |
| EP-1476509-B1 | SELF-POLISHING ANTIFOULING PAINT | JOTUN AS (NO) | 2007-04-11 | — | — | EP | disclosed |
| EP-1476509-A2 | SELF-POLISHING ANTIFOULING PAINT | Jotun AS (NO) | 2004-11-17 | — | — | EP | disclosed |
| WO-2003070832-A2 | SELF-POLISHING ANTIFOULING PAINT | JOTUN AS (NO) | 2003-08-28 | — | — | WO | disclosed |