Benzoic Acid

Benzoic Acid

SCHEMBL516718

O=C(O)c1ccccc1.O=C(O)c1ccccc1.O=C(O)c1ccccc1.[Zr]

nearest known ligand 0.93

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

CACNA1CCACNA1DCACNA1FCACNA1SDPP4HTR1BHTR1D

The experimentally established mechanism targets of Benzoic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.93
DAO P14920 1/20 0.93
NAPRT Q6XQN6 1/20 0.93
CES2 O00748 3/20 0.74
CES1 P23141 3/20 0.74
SRD5A2 P31213 2/20 0.74
TP53 P04637 1/20 0.69
ALDH1A1 P00352 2/20 0.61
TRPA1 O75762 1/20 0.56
CA12 O43570 2/20 0.55
CA1 P00915 2/20 0.55
CA2 P00918 2/20 0.55
CA3 P07451 2/20 0.55
CA4 P22748 2/20 0.55
CA6 P23280 2/20 0.55
CA5A P35218 2/20 0.55
CA7 P43166 2/20 0.55
CA9 Q16790 2/20 0.55
CA14 Q9ULX7 2/20 0.55
CA5B Q9Y2D0 2/20 0.55

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzoic Acid SCHEMBL5693310 1.00 TSHR (0.93) TSHRDAONAPRTCES2CES1
Benzoic Acid SCHEMBL3096136 1.00 TSHR (0.93) TSHRDAONAPRTCES2CES1
Benzoic Acid SCHEMBL27910871 1.00 TSHR (0.93) TSHRDAONAPRTCES2CES1
Benzoic Acid SCHEMBL29229337 0.97 TSHR (0.88) TSHRDAONAPRTCES2CES1
Benzoic Acid SCHEMBL6349698 0.97 TSHR (0.88) TSHRDAONAPRTCES2CES1
Benzoic Acid SCHEMBL976149 0.97 TSHR (1.00) TSHRDAONAPRTCES2CES1
Benzoic Acid SCHEMBL407365 0.97 TSHR (1.00) TSHRDAONAPRTCES2CES1
Benzoic Acid SCHEMBL975929 0.97 TSHR (1.00) TSHRDAONAPRTCES2CES1
Benzoic Acid SCHEMBL7719037 0.97 TSHR (1.00) TSHRDAONAPRTCES2CES1
Benzoic Acid SCHEMBL149318 0.97 TSHR (1.00) TSHRDAONAPRTCES2CES1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 65 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11988809-B2 Laminate, antireflection product, and manufacturing method thereof FUJIFILM CORPORATION (JP) 2024-05-21 US disclosed
US-20220075095-A1 LAMINATE, ANTIREFLECTION PRODUCT, AND MANUFACTURING METHOD THEREOF FUJIFILM CORPORATION (JP) 2022-03-10 US disclosed
US-11209575-B2 Laminate, antireflection product, and manufacturing method thereof FUJIFILM CORPORATION (JP) 2021-12-28 US disclosed
US-20190162878-A1 LAMINATE, ANTIREFLECTION PRODUCT, AND MANUFACTURING METHOD THEREOF FUJIFILM CORPORATION (JP) 2019-05-30 US disclosed
US-9633755-B2 Conductive composition, conductive member, conductive member production method, touch panel, and solar cell FUJIFILM CORPORATION (JP) 2017-04-25 US disclosed
US-9343594-B2 Conductive composition, conductive member and production method thereof, touch panel, and solar cell FUJIFILM CORPORATION (JP) 2016-05-17 US disclosed
EP-2067848-B1 INSTRUMENT FOR BIOCHEMICAL USE HAVING SURFACE UNDER THE INHIBITION OF NONSPECIFIC ADSORPTION FUJIFILM CORP (JP) 2016-03-02 EP disclosed
US-9224518-B2 Conductive composition, conductive member, conductive member production method, touch panel, and solar cell FUJIFILM CORPORATION (JP) 2015-12-29 US disclosed
EP-2492296-B1 Resin composition for laser engraving, relief printing plate precursor and process for producing the same, and relief printing plate FUJIFILM CORP (JP) 2015-12-16 EP disclosed
US-9070488-B2 Conductive composition, method of producing the same, conductive member, touch panel, and solar cell FUJIFILM CORPORATION (JP) 2015-06-30 US disclosed
US-20080226928-A1 HYDROPHILIC MEMBER AND PROCESS FOR PRODUCING THE SAME FUJIFILM CORPORATION (JP) 2008-09-18 US disclosed
EP-1970196-A2 Hydrophilic member and process for producing the same FUJIFILM Corporation (JP) 2008-09-17 EP disclosed
US-20080207849-A1 HYDROPHILIC FILM FORMING COMPOSITION AND HYDROPHILIC MEMBER FUJIFILM CORPORATION (JP) 2008-08-28 US disclosed
US-20080177022-A1 HYDROPHILIC FILM FORMING COMPOSITION AND HYDROPHILIC MEMBER FUJIFILM CORPORATION (JP) 2008-07-24 US disclosed
US-20080176085-A1 HYDROPHILIC COMPOSITION AND HYDROPHILIC MEMBER FUJIFILM CORPORATION (JP) 2008-07-24 US disclosed
EP-1923363-A2 Hydrophilic member and substrate for hydrophilic member FUJIFILM Corporation (JP) 2008-05-21 EP disclosed
US-20080102286-A1 HYDROPHILIC MEMBER AND SUBSTRATE FOR HYDROPHILIC MEMBER FUJIFILM CORPORATION (JP) 2008-05-01 US disclosed
EP-1911790-A2 Hydrophilic composition and hydrophilic member FUJIFILM Corporation (JP) 2008-04-16 EP disclosed
EP-1905784-A1 Hydrophilic film forming composition and hydrophilic member FUJIFILM Corporation (JP) 2008-04-02 EP disclosed
US-20080075873-A1 thermally-decomposing polymer blends including an alkoxide compound; catalyst promotes the reaction of polymer and alkoxides; heating to decompose the polymer to hydrophilic; soiling resistance, fogging resistance and abrasion resistance; protective coatings for mirrors, cars, lenses FUJIFILM CORPORATION (JP) 2008-03-27 US disclosed