Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5173389 | 0.81 | ALDH1A1 (0.33) | ALDH1A1LMNASMN1; SMN2 | |
| SCHEMBL4655557 | 0.81 | CYP2C19 (0.39) | ALDH1A1LMNASMN1; SMN2 | |
| SCHEMBL24780369 | 0.78 | ALDH1A1 (0.33) | ALDH1A1LMNA | |
| SCHEMBL11381350 | 0.77 | — | — | |
| Hydrochloric Acid SCHEMBL11381355 | 0.77 | CYP2C19 (0.34) | SMN1; SMN2 | |
| SCHEMBL18308884 | 0.74 | SMN1; SMN2 (0.34) | SMN1; SMN2 | |
| SCHEMBL27859473 | 0.70 | — | — | |
| SCHEMBL14234405 | 0.69 | — | — | |
| SCHEMBL15116873 | 0.69 | — | — | |
| SCHEMBL5130904 | 0.67 | FFAR3 (0.35) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1099983-B1 | Chemically amplified positive resist composition and patterning method | SHINETSU CHEMICAL CO (JP) | 2014-08-06 | — | — | EP | disclosed |
| EP-1136885-B1 | Chemically amplified positive resist composition and patterning method | SHINETSU CHEMICAL CO (JP) | 2007-05-09 | — | — | EP | disclosed |
| US-6593056-B2 | Chemically amplified positive resist composition and patterning method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-07-15 | — | — | US | disclosed |
| US-6511785-B1 | Polymer with alkenyloxy, acetal, and/or orthoester functional groups; forming contact hole pattern by thermal flow process | SHIN ETSU CHEMICAL CO., LTD. (JP) | 2003-01-28 | — | — | US | disclosed |
| US-20010035394-A1 | Chemically amplified positive resist composition and patterning method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-11-01 | — | — | US | disclosed |
| EP-1136885-A1 | Chemically amplified positive resist composition and patterning method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-09-26 | — | — | EP | disclosed |
| EP-1099983-A1 | Chemically amplified positive resist composition and patterning method | Shin-Etsu Chemical Co., Ltd. (JP) | 2001-05-16 | — | — | EP | disclosed |