Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | TSHR | P16473 | 3/20 | 0.38 |
| ▸ | THRB | P10828 | 1/20 | 0.35 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20629674 | 0.85 | ALDH1A1 (0.39) | ALDH1A1TSHRTHRBGAA | |
| SCHEMBL1067047 | 0.82 | ALDH1A1 (0.44) | ALDH1A1TSHRTHRBGAA | |
| SCHEMBL22353268 | 0.82 | ALDH1A1 (0.44) | ALDH1A1TSHRTHRBGAA | |
| SCHEMBL7978787 | 0.80 | ALDH1A1 (0.35) | ALDH1A1TSHRTHRB | |
| SCHEMBL21496027 | 0.80 | ALDH1A1 (0.42) | ALDH1A1TSHRTHRBGAA | |
| SCHEMBL347723 | 0.80 | ALDH1A1 (0.42) | ALDH1A1TSHRTHRBGAA | |
| SCHEMBL1371760 | 0.80 | ALDH1A1 (0.42) | ALDH1A1TSHRTHRBGAA | |
| SCHEMBL23494347 | 0.79 | TSHR (0.48) | ALDH1A1TSHRTHRB | |
| SCHEMBL20798785 | 0.79 | ALDH1A1 (0.34) | ALDH1A1TSHRTHRB | |
| SCHEMBL21023743 | 0.79 | GAA (0.43) | ALDH1A1TSHRTHRBGAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230400769-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-12-14 | — | — | US | disclosed |
| US-20230375925-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, COMPOUND, AND RESIN | FUJIFILM CORPORATION (JP) | 2023-11-23 | — | — | US | disclosed |
| US-20230367210-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-11-16 | — | — | US | disclosed |
| US-20230221640-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-07-13 | — | — | US | disclosed |
| US-20230185192-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-06-15 | — | — | US | disclosed |
| CN-106103517-A | Fluorine system surfactant, coating composition, protective agent compositions and solidfied material | DIC株式会社 | 2016-11-09 | — | — | CN | disclosed |
| WO-2015150508-A1 | AQUEOUS POLYMER COMPOSITIONS | BASF SE (DE) | 2015-10-08 | — | — | WO | disclosed |
| EP-1393922-B1 | Ink jet recording material | AGFA GEVAERT (BE) | 2007-06-06 | — | — | EP | disclosed |
| CN-1934499-A | Positively radiation-sensitive resin composition | JSR CORP (JP) | 2007-03-21 | — | — | CN | disclosed |
| CN-1806208-A | Photocurable resin composition | DSM IP ASSETS BV (NL) | 2006-07-19 | — | — | CN | disclosed |
| US-6924011-B2 | Ink jet recording material | AGFA GEVAERT (BE) | 2005-08-02 | — | — | US | disclosed |
| US-6794108-B1 | COMPOUND CAPABLE OF GENERATING ACID BY ACTINIC RADIATION; POLYMER AND COMPOUND THAT DECOMPOSE TO A SULFONIC ACID; STORAGE STABILITY | FUJI PHOTO FILM CO., LTD. (JP) | 2004-09-21 | — | — | US | disclosed |
| US-20040043163-A1 | Iink jet recording material | AGFA-GEVAERT (BE) | 2004-03-04 | — | — | US | disclosed |
| EP-1393922-A1 | Improved ink jet recording material | Agfa-Gevaert (BE) | 2004-03-03 | — | — | EP | disclosed |
| US-6329125-B2 | AN ALKALI-INSOLUBLE COMPOUND HAVING A PROTECTED ALKALI SOLUBLE GROUP IN WHICH PROTECTIVE GROUP CONTAINS AN ALICYCLIC HYDROCARBON GROUP HAVING BONDED TO A CARBON ATOM AND CLEAVED UPON ACTION OF AN ACID GENERATED FROM A PHOTOACID GEENERATOR | FUJITSU LIMITED (JP) | 2001-12-11 | — | — | US | disclosed |
| US-20010003640-A1 | Chemically amplified resist compositions and process for the formation of resist patterns | FUJITSU LIMITED (JP) | 2001-06-14 | — | — | US | disclosed |
| US-6200725-B1 | A SUBSTITUTED ALICYCLIC HYDROCARBON GROUP WHICH ACTS AS A PROTECTIVE GROUP TO AN ADDITIONAL POLYMER WHEN EXPOSED TO A POLYACID GENERATOR WHICH IS CAPABLE OF DECOMPOSING TO PATTERN RADIATION EPOSURE, PRODUCES ACID, CAPABLE OF DEPROTECTION | FUJITSU LIMITED (JP) | 2001-03-13 | — | — | US | disclosed |
| US-6013416-A | FILMS FOR PHOTORESISTS PATTERNS | FUJITSU LIMITED (JP) | 2000-01-11 | — | — | US | disclosed |
| US-5968713-A | ALKALI DEVELOPED RESISTS AND FILM FORMING COMPOUNDS WITH ALKALI SOLUBLE GROUPS AND GENERATION | FUJITSU LIMITED (JP) | 1999-10-19 | — | — | US | disclosed |