SCHEMBL5177935

SCHEMBL5177935

Brc1ccc(Oc2ccc(C3(c4ccc(Oc5ccc(Br)cc5)cc4)c4ccccc4-c4ccccc43)cc2)cc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.52
MEN1 O00255 2/20 0.52
KMT2A Q03164 2/20 0.52
KDM4E B2RXH2 1/20 0.52
LMNA P02545 1/20 0.52
OPRK1 P41145 1/20 0.52
SMN1; SMN2 Q16637 1/20 0.52
CES2 O00748 1/20 0.41
CES1 P23141 1/20 0.41
MAOA P21397 1/20 0.40
MAOB P27338 1/20 0.40
ESR1 P03372 1/20 0.40
ESR2 Q92731 1/20 0.40
PDK2 Q15119 2/20 0.39
SLC6A2 P23975 1/20 0.38
SLC6A4 P31645 1/20 0.38
SLC6A3 Q01959 1/20 0.38
POLB P06746 1/20 0.37
TSHR P16473 2/20 0.36
ALDH1A1 P00352 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL105865 0.89 MEN1 (0.63) MAPTMEN1KMT2AKDM4ELMNA
SCHEMBL28135141 0.89 MEN1 (0.63) MAPTMEN1KMT2AKDM4ELMNA
SCHEMBL30288909 0.89 MEN1 (0.63) MAPTMEN1KMT2AKDM4ELMNA
SCHEMBL31031086 0.88 MEN1 (0.47) MAPTMEN1KMT2AKDM4ELMNA
SCHEMBL17010782 0.88 LTA4H (0.42) MAPTMEN1KMT2AKDM4ELMNA
SCHEMBL25710612 0.87 MEN1 (0.57) MAPTMEN1KMT2AKDM4ELMNA
SCHEMBL22580553 0.87 MEN1 (0.57) MAPTMEN1KMT2AKDM4ELMNA
SCHEMBL283196 0.85 MEN1 (0.59) MAPTMEN1KMT2AKDM4ELMNA
SCHEMBL29506706 0.85 MEN1 (0.59) MAPTMEN1KMT2AKDM4ELMNA
SCHEMBL17816646 0.83 MEN1 (0.57) MAPTMEN1KMT2AKDM4ELMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1188807-B1 Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing JSR CORP (JP) 2007-10-17 EP disclosed
EP-1099719-B1 Diyne-containing (co) polymer, processes for producing the same, and cured film JSR CORP (JP) 2007-01-17 EP disclosed
US-7153767-B2 Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing JSR CORPORATION (JP) 2006-12-26 US disclosed
US-20050003218-A1 Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing JSR CORPORATION (JP) 2005-01-06 US disclosed
US-6528605-B1 Diyne-containing (co)polymer, processes for producing the same, and cured film JSR CORPORATION (JP) 2003-03-04 US disclosed
US-20020064953-A1 Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing JSR CORPORATION (JP) 2002-05-30 US disclosed
EP-1188807-A2 Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing JSR Corporation (JP) 2002-03-20 EP disclosed
EP-1099719-A1 Diyne-containing (co) polymer, processes for producing the same, and cured film JSR Corporation (JP) 2001-05-16 EP disclosed