SCHEMBL5178065

SCHEMBL5178065

O=C(O)C(c1ccccc1)C(O)c1ccccc1

nearest known ligand 0.73

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
▸ CYP2D6 P10635 1/20 0.73
▸ LMNA P02545 4/20 0.56
▸ MAPK1 P28482 1/20 0.56
▸ SRC P12931 2/20 0.52
▸ KMT2A Q03164 1/20 0.48
▸ AOC3 Q16853 1/20 0.48
▸ ALDH1A1 P00352 2/20 0.47
▸ ADRA2A P08913 1/20 0.46
▸ ADRA2C P18825 1/20 0.46
▸ HIF1A Q16665 1/20 0.46
▸ KDM4E B2RXH2 1/20 0.46
▸ CES2 O00748 1/20 0.45
▸ CES1 P23141 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27906641 0.86 CYP2D6 (0.58) CYP2D6LMNAMAPK1SRCKMT2A
SCHEMBL7824857 0.85 CYP2D6 (1.00) CYP2D6LMNAMAPK1SRCKMT2A
SCHEMBL659768 0.85 CYP2D6 (1.00) CYP2D6LMNAMAPK1SRCKMT2A
SCHEMBL7815004 0.85 CYP2D6 (1.00) CYP2D6LMNAMAPK1SRCKMT2A
SCHEMBL11315838 0.85 CYP2D6 (1.00) CYP2D6LMNAMAPK1SRCKMT2A
SCHEMBL21939337 0.83 CYP2D6 (0.76) CYP2D6LMNAMAPK1SRCKMT2A
SCHEMBL29015796 0.82 CYP2D6 (0.50) CYP2D6LMNAMAPK1SRCAOC3
SCHEMBL27818755 0.82 CYP2D6 (0.94) CYP2D6LMNAMAPK1SRCKMT2A
SCHEMBL6505819 0.81 SMN1; SMN2 (0.58) CYP2D6LMNAMAPK1ALDH1A1KDM4E
SCHEMBL28017300 0.81 CYP2D6 (0.73) CYP2D6LMNAMAPK1SRCKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1112995-B1 ALICYCLIC COMPOUNDS AND CURABLE RESIN COMPOSITION NISSAN CHEMICAL IND LTD (JP) 2007-04-11 — — EP disclosed
US-20060240350-A1 Developer, and image forming apparatus and process cartridge using the developer RICOH COMPANY LIMITED (JP) 2006-10-26 — — US disclosed
US-6365771-B1 CURABLE VINYL ETHER OR METHACRYLATE DERIVATIVES OF 4,7 METHANOINDENE OR INDANE; PHOTORESISTS, OPTICS, AND COATINGS NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2002-04-02 — — US disclosed
EP-1112995-A1 ALICYCLIC COMPOUNDS AND CURABLE RESIN COMPOSITION Nissan Chemical Industries, Ltd. (JP) 2001-07-04 — — EP disclosed
US-5368973-A Dispersion of microcapsules of ethylenically unsaturated compounds and polymerization initiaators, dispersion, swelling then coating and drying on a substrate FUJI PHOTO FILM CO., LTD. (JP) 1994-11-29 — — US disclosed
EP-0484127-A2 Light-sensitive element and process for preparation thereof Fuji Photo Film Co., Ltd. (JP) 1992-05-06 — — EP disclosed
US-4557991-A BINDER RESIN, WAX AND COLORANT KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1985-12-10 — — US disclosed
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