SCHEMBL5178137

SCHEMBL5178137

C=CC(=O)OC(O)C(CC)(OC(=O)C=C)n1c(=O)[nH]c(=O)[nH]c1=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27755602 0.72
SCHEMBL8075832 0.71 TSHR (0.30)
SCHEMBL13834296 0.71 TSHR (0.30)
SCHEMBL7640851 0.70 ALDH1A1 (0.40)
SCHEMBL1262710 0.70
SCHEMBL7027995 0.70 ALDH1A1 (0.35)
SCHEMBL28004952 0.69 TSHR (0.32)
SCHEMBL7935443 0.68
SCHEMBL28004997 0.67 TSHR (0.33)
SCHEMBL21808345 0.66 TSHR (0.34)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-58087117-A None JP disclosed
EP-1577090-B1 Lithographic printing plate precursor FUJIFILM CORP (JP) 2007-06-06 EP disclosed
US-20050208423-A1 Lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. 2005-09-22 US disclosed
EP-1577090-A2 Lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 2005-09-21 EP disclosed
EP-0633618-B1 LITHIUM SECONDARY CELL TDK CORP (JP) 2000-03-22 EP disclosed
EP-0662728-B1 Lithium secondary cell TDK CORP (JP) 1998-04-29 EP disclosed
US-5589297-A POWER SUPPLIES FOR DRIVING PORTABLE ELECTRONIC APPLIANCES TDK CORPORATION (JP) 1996-12-31 US disclosed
US-5565284-A STABILITY DURING CHARGING, DISCHARGING CYCLES TDK CORPORATION (JP) 1996-10-15 US disclosed
EP-0662728-A1 Lithium secondary cell TDK Corporation (JP) 1995-07-12 EP disclosed
EP-0633618-A1 LITHIUM SECONDARY CELL TDK Corporation (JP) 1995-01-11 EP disclosed
EP-0348063-B1 THERMOPLASTIC ELASTOMER AND PHOTOSENSITIVE RESIN COMPOSITION BASED THEREON, AND PRINTING PLATE PRECURSOR COMPRISING THE COMPOSITION Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1993-05-26 EP disclosed
US-5053316-A THERMOPLASTIC ELASTOMER AND PHOTOSENSITIVE RESIN COMPOSITION BASED THEREON, AND PRINTING PLATE PRECURSOR COMPRISING THE COMPOSITION ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1991-10-01 US disclosed
EP-0348063-A1 Thermoplastic elastomer and photosensitive resin composition based thereon, and printing plate precursor comprising the composition Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1989-12-27 EP disclosed
US-4855334-A ISOCYANURIC RING CONTAINING POLYMER; PROTECTIVE COATINGS DAINIPPON INK AND CHEMICALS, INC. (JP) 1989-08-08 US disclosed
EP-0132451-B1 CURABLE RESIN COMPOSITION AND ITS USE DAINIPPON INK AND CHEMICALS, INC. (JP) 1987-06-10 EP disclosed
EP-0132451-A1 Curable resin composition and its use DAINIPPON INK AND CHEMICALS, INC. (JP) 1985-02-13 EP disclosed
JP-S5887117-A CURABLE RESIN COMPOSITION DAINIPPON INK & CHEM INC 1983-05-24 JP disclosed