SCHEMBL5182474

SCHEMBL5182474

CC(C)(C)C(Cl)(Cl)C(=O)c1ccccc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CES1 P23141 7/20 0.50
▸ SRC P12931 1/20 0.46
▸ TSHR P16473 4/20 0.42
▸ ALDH1A1 P00352 4/20 0.42
▸ HSD17B10 Q99714 2/20 0.42
▸ TDP1 Q9NUW8 2/20 0.42
▸ CES2 O00748 5/20 0.42
▸ DAO P14920 1/20 0.42
▸ NAPRT Q6XQN6 1/20 0.42
▸ TRPA1 O75762 1/20 0.40
▸ MAPK1 P28482 1/20 0.40
▸ GSK3B P49841 1/20 0.40
▸ HIF1A Q16665 1/20 0.40
▸ CYP1A2 P05177 1/20 0.40
▸ POLB P06746 2/20 0.39
▸ CYP3A4 P08684 1/20 0.39
▸ PARP1 P09874 1/20 0.39
▸ MAPT P10636 1/20 0.39
▸ CYP2C19 P33261 1/20 0.39
▸ RECQL P46063 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2255352 0.82 CES1 (0.54) CES1SRCTSHRALDH1A1HSD17B10
SCHEMBL1445897 0.82 CES1 (0.54) CES1SRCTSHRALDH1A1HSD17B10
SCHEMBL6050014 0.80 CES1 (0.52) CES1SRCTSHRALDH1A1HSD17B10
SCHEMBL11308508 0.80 CES1 (0.52) CES1SRCTSHRALDH1A1HSD17B10
SCHEMBL11864550 0.80 CES1 (0.52) CES1SRCTSHRALDH1A1HSD17B10
SCHEMBL27638715 0.78 CES1 (0.50) CES1SRCTSHRALDH1A1HSD17B10
SCHEMBL5158726 0.78 CES1 (0.61) CES1SRCTSHRALDH1A1HSD17B10
SCHEMBL28445929 0.78 CES1 (0.61) CES1SRCTSHRALDH1A1HSD17B10
SCHEMBL5704582 0.77 CES1 (0.54) CES1SRCTSHRALDH1A1HSD17B10
SCHEMBL226691 0.77 CES1 (0.58) CES1SRCTSHRALDH1A1HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 115 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115521230-A Silicon-containing monomer, photocuring composition, packaging film and organic electroluminescent device comprising packaging film 吉林奥来德光电材料股份有限公司 2022-12-27 — — CN claimed
CN-117467340-A Anti-glare composition, anti-glare film, polarizer and display device 深圳市华星光电半导体显示技术有限公司 2024-01-30 — — CN disclosed
CN-114685551-B Compound for packaging film, composition and packaging film 吉林奥来德光电材料股份有限公司 2023-12-26 — — CN disclosed
CN-115521230-A Silicon-containing monomer, photocuring composition, packaging film and organic electroluminescent device comprising packaging film 吉林奥来德光电材料股份有限公司 2022-12-27 — — CN disclosed
CN-114685551-A Compound for packaging film, composition and packaging film 吉林奥来德光电材料股份有限公司 2022-07-01 — — CN disclosed
CN-113135952-B Light-cured monomer, light-cured composition, packaging film and display device 吉林奥来德光电材料股份有限公司 2022-06-17 — — CN disclosed
CN-111875521-B Compound for packaging film, preparation method thereof, curable composition and packaging film 吉林奥来德光电材料股份有限公司 2022-05-10 — — CN disclosed
CN-112538031-B Antioxidant for thin film packaging, composition and application thereof 吉林奥来德光电材料股份有限公司 2022-05-06 — — CN disclosed
WO-2022091714-A1 SURFACE PROTECTIVE FILM 日東電工株式会社 2022-05-05 — — WO disclosed
WO-2022071252-A1 RESIN FOR PIGMENT-DISPERSION MASTERBATCH FOR PRESSURE-SENSITIVE ADHESIVE, PIGMENT-DISPERSION MASTERBATCH FOR PRESSURE-SENSITIVE ADHESIVE, COLORED PRESSURE-SENSITIVE ADHESIVE COMPOSITION, AND PRESSURE-SENSITIVE ADHESIVE SHEET 日東電工株式会社 2022-04-07 — — WO disclosed
CN-1912742-A Colorant dispersion liquid and photosensitive composition using the same TOKYO OKE CHEMICAL CO LTD (JP) 2007-02-14 — — CN disclosed
CN-1900248-A Cleaning agent for resin composition TOKYO OHKA KOGYO CO LTD (JP) 2007-01-24 — — CN disclosed
CN-1697858-A Photo-curable and thermosetting resin composition TAIYO INK MFG CO LTD (JP) 2005-11-16 — — CN disclosed
EP-1546808-A1 PHOTOPOLYMERIZABLE RESIN COMPOSITION FOR SANDBLAST RESIST Kolon Industries, Inc. (KR) 2005-06-29 — — EP disclosed
WO-2004072736-A1 AG PASTE COMPOSITION FOR MICROELECTRODE FORMATION AND MICROELECTRODE FORMED USING THE SAME DONGJIN SEMICHEM CO. LTD. (KR) 2004-08-26 — — WO disclosed
WO-2004023212-A1 PHOTOPOLYMERIZABLE RESIN COMPOSITION FOR SANDBLAST RESIST KOLON INDUSTRIES INC. (KR) 2004-03-18 — — WO disclosed
CN-1103065-C Photoimageable composition having improved photoinitiator system NICHIGO MORTON CO LTD (JP) 2003-03-12 — — CN disclosed
US-6297911-B1 Micro lens array, method of fabricating the same, and display device SEIKO EPSON CORPORATION (JP) 2001-10-02 — — US disclosed
CN-1237720-A Photoimageable composition having improved photoinitiator system NICHIGO MORTON CO LTD (JP) 1999-12-08 — — CN disclosed
US-5571659-A IRRADIATION POLYMERIZATION OF GRAFT POLYMER WITH ACRYLATED POLYURETHANE CANON KABUSHIKI KAISHA (JP) 1996-11-05 — — US disclosed
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