Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ADH1B | P00325 | 1/20 | 0.33 |
| ▸ | ADH1A | P07327 | 1/20 | 0.33 |
| ▸ | ADH7 | P40394 | 1/20 | 0.33 |
| ▸ | CA1 | P00915 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27336222 | 0.90 | TSHR (0.30) | TSHR | |
| SCHEMBL15309954 | 0.74 | — | — | |
| SCHEMBL10024700 | 0.72 | ADH1B (0.30) | ADH1BADH1AADH7CA1 | |
| SCHEMBL14813076 | 0.72 | — | — | |
| SCHEMBL15309823 | 0.72 | — | — | |
| SCHEMBL23282559 | 0.72 | — | — | |
| SCHEMBL31302741 | 0.72 | — | — | |
| SCHEMBL5015144 | 0.67 | — | — | |
| SCHEMBL3469806 | 0.67 | — | — | |
| SCHEMBL180627 | 0.67 | TP53 (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 190 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250313953-A1 | METHODS AND SYSTEMS FOR FORMING DOPED SILICON NITRIDE FILMS | ASM IP HOLDING B.V. (NL) | 2025-10-09 | — | — | US | claimed |
| US-20250305131-A1 | LOW TEMPERATURE THERMAL DEPOSITION OF SILICON-CONTAINING FILMS USING LOW WATER CONTENT HYDROGEN PEROXIDE | GELEST, INC. | 2025-10-02 | — | — | US | claimed |
| US-20250270698-A1 | BORON-CONTAINING PRECURSORS FOR THE ALD DEPOSITION OF BORON NITRIDE FILMS | VERSUM MATERIALS US, LLC | 2025-08-28 | — | — | US | claimed |
| US-12378667-B2 | Methods and systems for forming doped silicon nitride films | ASM IP HOLDING B.V. (NL) | 2025-08-05 | — | — | US | claimed |
| EP-4493734-A1 | BORON-CONTAINING PRECURSORS FOR THE ALD DEPOSITION OF BORON NITRIDE FILMS | Versum Materials US, LLC (US) | 2025-01-22 | — | — | EP | claimed |
| US-20230407477-A1 | SUBSTRATE PROCESSING APPARATUS INCLUDING IMPROVED EXHAUST STRUCTURE | ASM IP HOLDING B.V. (NL) | 2023-12-21 | — | — | US | claimed |
| WO-2023201271-A1 | BORON-CONTAINING PRECURSORS FOR THE ALD DEPOSITION OF BORON NITRIDE FILMS | VERSUM MATERIALS US, LLC (US) | 2023-10-19 | — | — | WO | claimed |
| EP-3663301-B1 | BORON-CONTAINING COMPOUNDS, COMPOSITIONS, AND METHODS FOR THE DEPOSITION OF BORON CONTAINING FILMS | VERSUM MAT US LLC (US) | 2023-08-30 | — | — | EP | claimed |
| US-20230126516-A1 | METHODS AND SYSTEMS FOR FORMING DOPED SILICON NITRIDE FILMS | ASM IP HOLDING B.V. (NL) | 2023-04-27 | — | — | US | claimed |
| CN-115536687-B | Process for preparing trialkylaminosilanes and use thereof | 江苏南大光电材料股份有限公司 | 2023-04-11 | — | — | CN | claimed |
| US-20100009546-A1 | Aminosilanes for Shallow Trench Isolation Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-01-14 | — | — | US | claimed |
| EP-2144279-A2 | Aminosilanes for shallow trench isolation films | Air Products and Chemicals, Inc. (US) | 2010-01-13 | — | — | EP | claimed |
| US-7531452-B2 | Strained metal silicon nitride films and method of forming | TOKYO ELECTRON LIMITED (JP) | 2009-05-12 | — | — | US | claimed |
| US-7494937-B2 | Strained metal silicon nitride films and method of forming | TOKYO ELECTRON LIMITED (JP) | 2009-02-24 | — | — | US | claimed |
| WO-2008121463-A1 | METHOD FOR FORMING STRAINED SILICON NITRIDE FILMS AND A DEVICE CONTAINING SUCH FILMS | TOKYO ELECTRON LIMITED (JP) | 2008-10-09 | — | — | WO | claimed |
| US-20080242116-A1 | Method for forming strained silicon nitride films and a device containing such films | TOKYO ELECTRON LIMITED (JP) | 2008-10-02 | — | — | US | claimed |
| US-20080241388-A1 | Strained metal silicon nitride films and method of forming | TOKYO ELECTRON LIMITED (JP) | 2008-10-02 | — | — | US | claimed |
| US-20080242077-A1 | Strained metal silicon nitride films and method of forming | TOKYO ELECTRON LIMITED (JP) | 2008-10-02 | — | — | US | claimed |
| US-20080081470-A1 | Method for forming strained silicon nitride films and a device containing such films | TOKYO ELECTRON LIMITED (JP) | 2008-04-03 | — | — | US | claimed |
| US-20060062917-A1 | Vapor deposition of hafnium silicate materials with tris(dimethylamino)silane | APPLIED MATERIALS, INC. | 2006-03-23 | — | — | US | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20250270698-A1 | BORON-CONTAINING PRECURSORS FOR THE ALD DEPOSITION OF BORON NITRIDE FILMS | AKR1C3, NR1I3, AKR1C2 | ADH1B 235/4885ADH1A 39/4885ADH7 571/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.