SCHEMBL52224

SCHEMBL52224

CN1C(=CC(=O)c2ccccc2)Sc2ccccc21

nearest known ligand 0.76

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ RAB9A P51151 12/20 0.76
▸ ALDH1A1 P00352 12/20 0.76
▸ MAPT P10636 11/20 0.76
▸ NPC1 O15118 10/20 0.76
▸ SMN1; SMN2 Q16637 6/20 0.76
▸ L3MBTL1 Q9Y468 5/20 0.76
▸ KDM4E B2RXH2 4/20 0.76
▸ NFKB1 P19838 3/20 0.76
▸ NFKB2 Q00653 3/20 0.76
▸ RELA Q04206 3/20 0.76
▸ MEN1 O00255 6/20 0.74
▸ KMT2A Q03164 6/20 0.74
▸ POLB P06746 3/20 0.74
▸ PKM P14618 3/20 0.70
▸ NPSR1 Q6W5P4 3/20 0.70
▸ TP53 P04637 4/20 0.67
▸ TDP1 Q9NUW8 3/20 0.67
▸ CASP1 P29466 3/20 0.67
▸ HTT P42858 3/20 0.67
▸ CASP7 P55210 2/20 0.67

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL52223 1.00 RAB9A (0.76) RAB9AALDH1A1MAPTNPC1SMN1; SMN2
SCHEMBL29554643 1.00 RAB9A (0.76) RAB9AALDH1A1MAPTNPC1SMN1; SMN2
SCHEMBL3777551 1.00 RAB9A (0.76) RAB9AALDH1A1MAPTNPC1SMN1; SMN2
SCHEMBL15274804 0.90 RAB9A (0.74) RAB9AALDH1A1MAPTNPC1SMN1; SMN2
SCHEMBL13007501 0.86 RAB9A (0.70) RAB9AALDH1A1MAPTNPC1SMN1; SMN2
SCHEMBL13007497 0.86 MAPT (0.77) RAB9AALDH1A1MAPTNPC1SMN1; SMN2
Quinoline SCHEMBL27553774 0.86 RAB9A (0.67) RAB9AALDH1A1MAPTNPC1SMN1; SMN2
SCHEMBL9950735 0.85 MAPT (0.60) RAB9AALDH1A1MAPTNPC1SMN1; SMN2
SCHEMBL8853089 0.85 RAB9A (0.68) RAB9AALDH1A1MAPTNPC1SMN1; SMN2
SCHEMBL13007511 0.85 MAPT (0.68) RAB9AALDH1A1MAPTNPC1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 304 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11382868-B2 Transdermal UV-curable hydrogel resin, hydrogel curing the same and cataplasm containing the same ICURE PHARMACEUTICAL INC. (KR) 2022-07-12 — — US claimed
US-20190046463-A1 ULTRAVIOLET-HARDENING HYDROGEL RESIN AND HYDROGEL FOR TRANSDERMAL ADMINISTRATION, AND CATAPLASM AGENT CONTAINING SAME ICURE PHARMACEUTICAL INC. (KR) 2019-02-14 — — US claimed
EP-3415141-A1 ULTRAVIOLET-HARDENING HYDROGEL RESIN AND HYDROGEL FOR TRANSDERMAL ADMINISTRATION, AND CATAPLASM AGENT CONTAINING SAME Icure Pharmaceutical Inc. (KR) 2018-12-19 — — EP claimed
EP-4743828-A1 PHOTOCURABLE AS WELL AS THERMALLY CURABLE COMPOSITIONS SUITABLE FOR LOW TEMPERATURE CURING BASF SE (DE) 2026-05-20 — — EP disclosed
US-20250149336-A1 PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2025-05-08 — — US disclosed
CN-114129544-B Ultraviolet curable hydrogel resin for transdermal administration, hydrogel, and cataplasm comprising same Icure药品株式会社 2025-03-21 — — CN disclosed
CN-119403840-A Photocurable composition, method for producing cured film, solid-state imaging element, image display device, and radical polymerization initiator 富士胶片株式会社 2025-02-07 — — CN disclosed
WO-2025011754-A1 PHOTOCURABLE AS WELL AS THERMALLY CURABLE COMPOSITIONS SUITABLE FOR LOW TEMPERATURE CURING BASF SE (DE) 2025-01-16 — — WO disclosed
CN-119072499-A Photoinitiator 意大利艾坚蒙树脂有限公司 2024-12-03 — — CN disclosed
EP-4114825-B1 OXIME ESTER PHOTOINITIATORS BASF SE (DE) 2024-11-20 — — EP disclosed
CN-118696028-A Novel photoinitiators 意大利艾坚蒙树脂有限公司 2024-09-24 — — CN disclosed
EP-1132775-A1 Presensitized plate useful for preparing a lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2001-09-12 — — EP disclosed
US-20010012596-A1 For resist applications; thermostability, storage stability CIBA SPECIALTY CHEMICALS CORP. 2001-08-09 — — US disclosed
US-5145885-A Morpholine compound, binders CIBA-GEIGY CORPORATION (US) 1992-09-08 — — US disclosed
US-4992547-A Aminoaryl ketone photoinitiators CIBA-GEIGY CORPORATION (US) 1991-02-12 — — US disclosed
EP-0138754-B1 PHOTOCURABLE COMPOSITIONS CIBA-GEIGY AG (CH) 1988-05-25 — — EP disclosed
US-4684601-A UNSATURATED, HIGH MOLECULAR WEIGHT DAINIPPON INK AND CHEMICALS, INC. (JP) 1987-08-04 — — US disclosed
US-4640887-A C,M UNSATURATED POLYESTERS WITH FREE CARBOXY GROUPS; PRINTING DURABLE PLATES WITH IMPROVED OLEOPHILICITY DAINIPPON INK AND CHEMICALS, INC. (JP) 1987-02-03 — — US disclosed
US-4591545-A Photosensitive image-forming material having a layer of photosensitive polyester modified with chain extender DAINIPPON INK AND CHEMICALS, INC. (JP) 1986-05-27 — — US disclosed
EP-0138754-A2 Photocurable compositions CIBA-GEIGY AG (CH) 1985-04-24 — — EP disclosed
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