SCHEMBL5224007

SCHEMBL5224007

Cc1ccc(OB(O)O)c2ccccc12

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 4/20 0.52
CYP2A6 P11509 3/20 0.46
ALDH1A1 P00352 2/20 0.40
MEN1 O00255 2/20 0.38
ESR1 P03372 2/20 0.38
KMT2A Q03164 2/20 0.38
ESR2 Q92731 2/20 0.38
HTT P42858 1/20 0.35
TSHR P16473 3/20 0.35
ACHE P22303 1/20 0.35
IDO1 P14902 1/20 0.34
PKM P14618 1/20 0.34
NPC1 O15118 1/20 0.34
RAB9A P51151 1/20 0.34
GAA P10253 1/20 0.34
GRIN2D O15399 1/20 0.33
GRIN3B O60391 1/20 0.33
GRIN1 Q05586 1/20 0.33
GRIN2A Q12879 1/20 0.33
GRIN2B Q13224 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7647248 0.83 CYP1A2 (0.56) CYP1A2CYP2A6ALDH1A1MEN1ESR1
SCHEMBL30103879 0.82 IDO1 (0.53) CYP1A2ALDH1A1KMT2AHTTTSHR
SCHEMBL350128 0.76 TSHR (0.45) CYP1A2ALDH1A1MEN1KMT2ATSHR
SCHEMBL30366069 0.76 TSHR (0.45) CYP1A2ALDH1A1MEN1KMT2ATSHR
SCHEMBL1245632 0.76 PKM (0.53) MEN1KMT2ATSHRIDO1PKM
SCHEMBL29112050 0.76 TSHR (0.53) CYP1A2CYP2A6ALDH1A1MEN1KMT2A
SCHEMBL29942508 0.76 PKM (0.53) MEN1KMT2ATSHRIDO1PKM
SCHEMBL6270416 0.76 CYP2C9 (0.41) MEN1KMT2ATSHRPKMNPC1
SCHEMBL28659172 0.74 CYP2D6 (0.42) ALDH1A1MEN1KMT2AESR2IDO1
SCHEMBL26022648 0.74 HTT (0.62) CYP1A2ALDH1A1MEN1ESR1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118076660-A Photocurable composition, cured product, laminate, method for producing cured product, and method for producing lens 三井化学株式会社 2024-05-24 CN disclosed
CN-116149137-A Curable resin composition and cured film 住友化学株式会社 2023-05-23 CN disclosed
CN-111183187-A Molded article 古河电气工业株式会社 2020-05-19 CN disclosed
CN-105385362-B Adhesive composition and connection structure 日立化成株式会社 2020-05-15 CN disclosed
CN-111148798-A Molded article 古河电气工业株式会社 2020-05-12 CN disclosed
CN-1940720-B Photosensitive resin composition SUMITOMO CHEMICAL CO 2011-02-16 CN disclosed
EP-1825328-A2 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE DRY FILM BY THE USE THEREOF TOKYO OHKA KOGYO CO., LTD. (JP) 2007-08-29 EP disclosed
CN-1940720-A Photosensitive resin composition SUMITOMO CHEMICAL CO (JP) 2007-04-04 CN disclosed
WO-2006057423-A2 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE DRY FILM BY THE USE THEREOF TOKYO OHKA KOGYO CO., LTD. (JP) 2006-06-01 WO disclosed
WO-2005103823-A1 PHOTOSENSITIVE COMPOSITION FOR BLACK MATRIX SHOWA DENKO K.K. (JP) 2005-11-03 WO disclosed
EP-1392317-A4 SUBSTITUTED 1-BENZAZEPINES AND DERIVATIVES THEREOF ANTEXPHARMA INC (US) 2005-10-19 EP disclosed
EP-1554252-A1 HEXAARYLBIIMIDAZOLE COMPOUNDS AND PHOTOPOLYMERIZATION INITIATOR COMPOSITIONS CONTAINING THE SAME Showa Denko K.K. (JP) 2005-07-20 EP disclosed
WO-2004035546-A1 HEXAARYLBIIMIDAZOLE COMPOUNDS AND PHOTOPOLYMERIZATION INITIATOR COMPOSITIONS CONTAINING THE SAME SHOWA DENKO K. K. (JP) 2004-04-29 WO disclosed
EP-1392317-A2 SUBSTITUTED 1-BENZAZEPINES AND DERIVATIVES THEREOF Antexpharma, Inc. (US) 2004-03-03 EP disclosed
EP-1388025-A2 PHOTOSENSITIVE COLORING COMPOSITON, COLOR FILTER USING THE COMPOSITON AND METHOD OF PRODUCING THE SAME Showa Denko K.K. (JP) 2004-02-11 EP disclosed
US-6562543-B2 Comprising a compound having one or two nitrogen-containing 5-or 6- membered heterocyclic ring having a double bond within the ring, a primary, secondary, or tertiary amino compound, or a mercapto compound; heat stability SHOWA DENKO K.K. (JP) 2003-05-13 US disclosed
WO-2002100327-A2 SUBSTITUTED 1-BENZAZEPINES AND DERIVATIVES THEREOF ANTEXPHARMA, INC. (US) 2002-12-19 WO disclosed
WO-2002093255-A2 PHOTOSENSITIVE COLORING COMPOSITON, COLOR FILTER USING THE COMPOSITON AND METHOD OF PRODUCING THE SAME SHOWA DENKO K. K. (JP) 2002-11-21 WO disclosed
US-20010046643-A1 Stabilizer for organic borate salts and photosensitive composition containing the same OGATA TOMONARI (JP) 2001-11-29 US disclosed