⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11182940 | 0.76 | — | — | |
| SCHEMBL3823894 | 0.73 | CA2 (0.31) | — | |
| SCHEMBL4388666 | 0.72 | — | — | |
| SCHEMBL20522561 | 0.72 | MAOB (0.44) | — | |
| SCHEMBL17756694 | 0.70 | — | — | |
| SCHEMBL14130970 | 0.67 | — | — | |
| SCHEMBL22016455 | 0.65 | — | — | |
| SCHEMBL20375458 | 0.65 | — | — | |
| SCHEMBL3259513 | 0.64 | CA1 (0.31) | — | |
| SCHEMBL2664450 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1830229-A2 | Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same | SAMSUNG ELECTRONIC CO. LTD. (KR) | 2007-09-05 | — | — | EP | disclosed |
| US-6897005-B2 | Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same | SAMSUNG ELECTRONICS, CO., LTD. (KR) | 2005-05-24 | — | — | US | disclosed |
| US-20040137363-A1 | Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same | CHOI SANG-JUN (KR) | 2004-07-15 | — | — | US | disclosed |
| US-6673513-B2 | COPOLYMER OF MALEIC ANHYDRIDE AND ALKYL VINYL ETHER OR UNSATURATED OXYGEN CONTAINING RINGS SUCH AS 3,4-DIHYDRO-2H-PYRAN, AND TERPOLYMERS WITH ACRYLATE HAVING ACID LABILE HYDROCARBON GROUP; ETCH RESISTANCE, GOOD ADHESION | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-01-06 | — | — | US | disclosed |
| US-6517990-B1 | Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-02-11 | — | — | US | disclosed |
| US-20010024763-A1 | Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2001-09-27 | — | — | US | disclosed |
| EP-1120689-A2 | Photosensitive copolymers of alkyl vinyl ether and resist compositions containing the same | SAMSUNG ELECTRONICS CO. LTD. (KR) | 2001-08-01 | — | — | EP | disclosed |