Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNA3 | P22001 | 1/20 | 0.62 |
| ▸ | DRD2 | P14416 | 2/20 | 0.50 |
| ▸ | DRD4 | P21917 | 2/20 | 0.50 |
| ▸ | DRD3 | P35462 | 2/20 | 0.50 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.50 |
| ▸ | RECQL | P46063 | 1/20 | 0.50 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.50 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.50 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.50 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.50 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.50 |
| ▸ | HDAC10 | Q969S8 | 1/20 | 0.50 |
| ▸ | HDAC11 | Q96DB2 | 1/20 | 0.50 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.50 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.50 |
| ▸ | HDAC9 | Q9UKV0 | 1/20 | 0.50 |
| ▸ | HDAC5 | Q9UQL6 | 1/20 | 0.50 |
| ▸ | LTA4H | P09960 | 2/20 | 0.48 |
| ▸ | HTR1B | P28222 | 2/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17476338 | 0.92 | KCNA3 (0.64) | KCNA3DRD2DRD4DRD3TAAR1 | |
| SCHEMBL17476377 | 0.92 | KCNA3 (0.64) | KCNA3DRD2DRD4DRD3TAAR1 | |
| SCHEMBL2685625 | 0.92 | KCNA3 (0.64) | KCNA3DRD2DRD4DRD3TAAR1 | |
| SCHEMBL17476367 | 0.92 | KCNA3 (0.64) | KCNA3DRD2DRD4DRD3TAAR1 | |
| SCHEMBL17476375 | 0.92 | KCNA3 (0.64) | KCNA3DRD2DRD4DRD3TAAR1 | |
| SCHEMBL17476329 | 0.92 | KCNA3 (0.64) | KCNA3DRD2DRD4DRD3TAAR1 | |
| SCHEMBL1497968 | 0.92 | KCNA3 (0.64) | KCNA3DRD2DRD4DRD3TAAR1 | |
| SCHEMBL4947003 | 0.91 | KCNA3 (0.52) | KCNA3DRD2DRD4DRD3TAAR1 | |
| SCHEMBL6514017 | 0.91 | KCNA3 (0.52) | KCNA3DRD2DRD4DRD3TAAR1 | |
| SCHEMBL8968038 | 0.91 | KCNA3 (0.52) | KCNA3DRD2DRD4DRD3TAAR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 278 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4688684-A1 | COATED LENS BODY | Rodenstock GmbH (DE) | 2026-02-11 | — | — | EP | claimed |
| WO-2024200260-A1 | COATED LENS BODY | RODENSTOCK GMBH (DE) | 2024-10-03 | — | — | WO | claimed |
| EP-2567940-B1 | METHOD FOR PREPARING CLAYS HAVING NOVEL PHYSICO-CHEMICAL PROPERTIES | ECOLE DE BIOLOGIE IND (EBI) (FR) | 2017-06-21 | — | — | EP | claimed |
| EP-2396405-B1 | SPATIALLY INHOMOGENOUSLY FUNCTIONALIZED POROUS MEDIA AND METHOD FOR USE IN SELECTIVE REMOVAL OF CONTAMINANTS | UNIV ROCHESTER (US) | 2016-12-14 | — | — | EP | claimed |
| CN-101657758-B | Alkaline-resistant negative photoresist for silicon wet-etch without silicon nitride | BREWER SCIENCE INC | 2015-03-04 | — | — | CN | claimed |
| WO-2014170799-A1 | CROSSLINKABLE VARNISH AND METHOD FOR APPLYING SAME | COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES (FR) | 2014-10-23 | — | — | WO | claimed |
| US-20130153263-A1 | INORGANIC NANOFILLER, PARTIAL DISCHARGE RESISTANT ENAMELED WIRE INCLUDING THE SAME, AND PREPARING METHOD OF THE ENAMELED WIRE | SEJONG UNIVERSITY INDUSTRY ACADEMY COOPERATION FOUNDATION (KR) | 2013-06-20 | — | — | US | claimed |
| CN-101258444-B | Negative photoresist for silicon KOH etch without silicon nitride | BREWER SCIENCE INC | 2013-04-03 | — | — | CN | claimed |
| EP-1932060-B1 | NEGATIVE PHOTOSENSITIVE COMPOSITION FOR SILICON KOH ETCH WITHOUT USING SILICON NITRIDE HARDMASK | BREWER SCIENCE INC (US) | 2013-03-27 | — | — | EP | claimed |
| EP-2567940-A1 | Method for preparing clays having novel physical-chemical properties | Ecole De Biologie Industrielle (EBI) (FR) | 2013-03-13 | — | — | EP | claimed |
| US-7695890-B2 | Negative photoresist for silicon KOH etch without silicon nitride | BREWER SCIENCE INC. (US) | 2010-04-13 | — | — | US | claimed |
| CN-101657758-A | Alkaline-resistant negative photoresist for silicon wet-etch without silicon nitride | BREWER SCIENCE INC US | 2010-02-24 | — | — | CN | claimed |
| EP-2142960-A1 | ALKALINE-RESISTANT NEGATIVE PHOTORESIST FOR SILICON WET-ETCH WITHOUT SILICON NITRIDE | Brewer Science, Inc. (US) | 2010-01-13 | — | — | EP | claimed |
| US-20080261145-A1 | Photoresist layer blend of acrylonitrile-styrene copolymer, (bis)phenol novolac epoxy resin, and photoacid generator of triarylsulfonium or diaryliodonium hexafluoroantimonate or hexafluoro-phosphate; silane dissolved inprimer layer; microelectromechanical systems, microelectronics; corrosion resistance | NAVY, SECRETARY OF THE UNITED STATES OF AMERICA | 2008-10-23 | — | — | US | claimed |
| WO-2008127785-A1 | ALKALINE-RESISTANT NEGATIVE PHOTORESIST FOR SILICON WET-ETCH WITHOUT SILICON NITRIDE | BREWER SCIENCE INC. (US) | 2008-10-23 | — | — | WO | claimed |
| CN-101258444-A | Negative photoresist for silicon KOH etch without silicon nitride | BREWER SCIENCE INC (US) | 2008-09-03 | — | — | CN | claimed |
| EP-1932060-A1 | NEGATIVE PHOTORESIST FOR SILICON KOH ETCH WITHOUT SILICON NITRIDE | Brewer Science, Inc. (US) | 2008-06-18 | — | — | EP | claimed |
| US-20070075309-A1 | NEGATIVE PHOTORESIST FOR SILICON KOH ETCH WITHOUT SILICON NITRIDE | BREWER SCIENCE INC. | 2007-04-05 | — | — | US | claimed |
| WO-2007030593-A1 | NEGATIVE PHOTORESIST FOR SILICON KOH ETCH WITHOUT SILICON NITRIDE | BREWER SCIENCE INC. (US) | 2007-03-15 | — | — | WO | claimed |
| US-4228092-A | BY ALCOHOL ESTERIFICATION | DYNAMIT NOBEL AKTIENGESELLSCHAFT (DE) | 1980-10-14 | — | — | US | claimed |