SCHEMBL525838

SCHEMBL525838

CC(F)(F)C(F)(F)C(F)(F)C(F)(F)[C](F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7782659 0.97 THRB (0.31)
SCHEMBL7783416 0.97 THRB (0.31)
SCHEMBL732983 0.97 THRB (0.31)
SCHEMBL7780933 0.97 THRB (0.31)
SCHEMBL1772080 0.97 THRB (0.31)
SCHEMBL7782664 0.97 THRB (0.31)
SCHEMBL967742 0.97 THRB (0.31)
SCHEMBL7783379 0.97 THRB (0.31)
SCHEMBL967488 0.97 THRB (0.31)
SCHEMBL654937 0.97 THRB (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 254 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024138977-A1 HYBRID EMULSION AND PREPARATION METHOD THEREFOR 上海华谊三爱富新材料有限公司 2024-07-04 WO claimed
CN-114478924-B Organic dielectric material, composite film, and preparation method and application thereof 华南师范大学 2024-01-09 CN claimed
CN-116284581-A Hybrid emulsion and preparation method thereof 上海华谊三爱富新材料有限公司 2023-06-23 CN claimed
CN-114478924-A Organic dielectric material, composite film, preparation method and application thereof 华南师范大学 2022-05-13 CN claimed
CN-111233342-A Hydrophobic substrate, preparation method thereof, electronic screen and electronic device 华南师范大学 2020-06-05 CN claimed
WO-2024138977-A1 HYBRID EMULSION AND PREPARATION METHOD THEREFOR 上海华谊三爱富新材料有限公司 2024-07-04 WO disclosed
CN-107209146-B Electrochemical gas sensor and electrolyte for electrochemical gas sensor 德尔格安全股份两合公司 2024-03-12 CN disclosed
CN-114478924-B Organic dielectric material, composite film, and preparation method and application thereof 华南师范大学 2024-01-09 CN disclosed
US-11782342-B2 Salt and photoresist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-10-10 US disclosed
WO-2023188609-A1 ANTIFOULING TREATMENT AGENT, ANTIFOULING TREATMENT AGENT STOCK SOLUTION, AND ANTIFOULING TREATMENT METHOD パナソニックIPマネジメント株式会社 2023-10-05 WO disclosed
CN-116284581-A Hybrid emulsion and preparation method thereof 上海华谊三爱富新材料有限公司 2023-06-23 CN disclosed
US-11640114-B2 Compound, resin, photoresist composition and process for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-05-02 US disclosed
EP-1173449-A1 PHOSPHORIC BENZOYL DERIVATIVES AND THEIR USE AS HERBICIDES BASF AKTIENGESELLSCHAFT (DE) 2002-01-23 EP disclosed
EP-0825167-B1 COMPOUNDS AND SURFACTANTS ASAHI DENKA KOGYO KK (JP) 2001-10-04 EP disclosed
WO-2001036399-A1 AZADIOXACYCLOALKENES BASF AKTIENGESELLSCHAFT (DE) 2001-05-25 WO disclosed
EP-1076660-A1 SUBSTITUTED (4-BROMPYRAZOLE-3-YL)BENZAZOLES BASF AKTIENGESELLSCHAFT (DE) 2001-02-21 EP disclosed
WO-2000064912-A1 PHOSPHORIC BENZOYL DERIVATIVES AND THEIR USE AS HERBICIDES BASF AKTIENGESELLSCHAFT (DE) 2000-11-02 WO disclosed
WO-1999055702-A1 SUBSTITUTED (4-BROMPYRAZOLE-3-YL)BENZAZOLES BASF AKTIENGESELLSCHAFT (DE) 1999-11-04 WO disclosed
US-5929290-A A HYDROPHILIC POLYETHER HAVING A FLUORO-SUBSTITUTED ALKYL END GROUP AND A (METH)ALLYL GLYCIDYL END GROUP; EMULSIFIERS AND DISPERSANTS FOR EMULSION AND SUSPENSION POLYMERIZATION, RESP.; RESIN REFORMING AGENTS; ANTISOILANTS FOR POLYESTERS ASAHI DENKA KOGYO K. K. (JP) 1999-07-27 US disclosed
EP-0825167-A1 COMPOUNDS AND SURFACTANTS ASAHI DENKA KOGYO KABUSHIKI KAISHA (JP) 1998-02-25 EP disclosed