⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30155033 | 0.65 | — | — | |
| Hydrochloric Acid SCHEMBL3693818 | 0.65 | — | — | |
| Hydrochloric Acid SCHEMBL7080140 | 0.65 | — | — | |
| SCHEMBL8965962 | 0.63 | — | — | |
| SCHEMBL38658252 | 0.63 | — | — | |
| SCHEMBL10882630 | 0.61 | PTPN1 (0.35) | — | |
| SCHEMBL21330070 | 0.60 | — | — | |
| SCHEMBL12832399 | 0.57 | CTSD (0.37) | — | |
| SCHEMBL11565768 | 0.57 | — | — | |
| SCHEMBL21477482 | 0.52 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9905414-B2 | Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2018-02-27 | — | — | US | disclosed |
| US-20160268121-A1 | VAPOR DEPOSITION OF METAL OXIDES, SILICATES AND PHOSPHATES, AND SILICON DIOXIDE | PRESIDENT AND FELLOWS OF HARVARD COLLEGE | 2016-09-15 | — | — | US | disclosed |
| US-20160111276-A1 | VAPOR DEPOSITION OF METAL OXIDES, SILICATES AND PHOSPHATES, AND SILICON DIOXIDE | PRESIDENT AND FELLOWS OF HARVARD COLLEGE | 2016-04-21 | — | — | US | disclosed |
| US-20160087066-A1 | VAPOR DEPOSITION OF METAL OXIDES, SILICATES AND PHOSPHATES, AND SILICON DIOXIDE | PRESIDENT AND FELLOWS OF HARVARD COLLEGE | 2016-03-24 | — | — | US | disclosed |
| EP-1327010-B1 | VAPOR DEPOSITION OF SILICATES | HARVARD COLLEGE (US) | 2013-12-04 | — | — | EP | disclosed |
| US-20130122328-A1 | VAPOR DEPOSITION OF METAL OXIDES, SILICATES AND PHOSPHATES, AND SILICON DIOXIDE | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2013-05-16 | — | — | US | disclosed |
| US-8334016-B2 | Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2012-12-18 | — | — | US | disclosed |
| US-20120028478-A1 | VAPOR DEPOSITION OF METAL OXIDES, SILICATES AND PHOSPHATES, AND SILICON DIOXIDE | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2012-02-02 | — | — | US | disclosed |
| US-7507848-B2 | Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2009-03-24 | — | — | US | disclosed |
| EP-1772534-A2 | Tungsten-containing and hafnium-containing precursors for vapor deposition | The President and Fellows of Harvard College (US) | 2007-04-11 | — | — | EP | disclosed |
| US-20050277780-A1 | Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide | PRESIDENT AND FELLOWS OF HARVARD COLLEGE | 2005-12-15 | — | — | US | disclosed |
| US-6969539-B2 | Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2005-11-29 | — | — | US | disclosed |
| US-20040043149-A1 | Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide | PRESIDENT AND FELLOWS OF HARVARD COLLEGE | 2004-03-04 | — | — | US | disclosed |
| EP-1327010-A2 | VAPOR DEPOSITION OF OXIDES, SILICATES AND PHOSPHATES | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2003-07-16 | — | — | EP | disclosed |
| WO-2002027063-A2 | VAPOR DEPOSITION OF OXIDES, SILICATES AND PHOSPHATES | PRESIDENT AND FELLOWS OF HARWARD COLLEGE (US) | 2002-04-04 | — | — | WO | disclosed |