Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | USP2 | O75604 | 1/20 | 0.69 |
| ▸ | HTT | P42858 | 2/20 | 0.57 |
| ▸ | LPAR5 | Q9H1C0 | 4/20 | 0.54 |
| ▸ | SPHK1 | Q9NYA1 | 1/20 | 0.53 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.47 |
| ▸ | PLA2G2C | Q5R387 | 1/20 | 0.46 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.43 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.43 |
| ▸ | MEN1 | O00255 | 1/20 | 0.43 |
| ▸ | THRB | P10828 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
| ▸ | MAPT | P10636 | 1/20 | 0.43 |
| ▸ | LPAR1 | Q92633 | 7/20 | 0.42 |
| ▸ | LPAR3 | Q9UBY5 | 7/20 | 0.42 |
| ▸ | LPAR2 | Q9HBW0 | 4/20 | 0.42 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.41 |
| ▸ | LPAR6 | P43657 | 3/20 | 0.40 |
| ▸ | LPAR4 | Q99677 | 3/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5268818 | 0.97 | USP2 (0.65) | USP2HTTLPAR5SPHK1TDP1 | |
| SCHEMBL5268735 | 0.97 | USP2 (0.65) | USP2HTTLPAR5SPHK1TDP1 | |
| SCHEMBL6277233 | 0.95 | USP2 (0.62) | USP2HTTLPAR5SPHK1TDP1 | |
| SCHEMBL191722 | 0.93 | USP2 (0.58) | USP2HTTLPAR5SPHK1TDP1 | |
| SCHEMBL11436363 | 0.90 | USP2 (0.54) | USP2HTTLPAR5SPHK1TDP1 | |
| SCHEMBL1576197 | 0.90 | USP2 (0.54) | USP2HTTLPAR5SPHK1TDP1 | |
| SCHEMBL11431109 | 0.88 | TDP1 (0.60) | USP2HTTLPAR5SPHK1TDP1 | |
| Methacrylic Acid SCHEMBL11760428 | 0.85 | USP2 (0.51) | USP2HTTLPAR5SPHK1TDP1 | |
| SCHEMBL9813411 | 0.85 | USP2 (0.71) | USP2HTTLPAR5SPHK1PLA2G2C | |
| SCHEMBL6276347 | 0.84 | TDP1 (0.61) | USP2HTTLPAR5SPHK1TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240118612-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING RESIST PATTERN FILM, AND METHOD FOR MANUFACTURING PLATED SHAPED ARTICLE | JSR CORPORATION (JP) | 2024-04-11 | — | — | US | disclosed |
| US-20210311391-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR MANUFACTURING PLATED FORMED BODY, AND SEMICONDUCTOR DEVICE | JSR CORPORATION (JP) | 2021-10-07 | — | — | US | disclosed |
| WO-2020039755-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR MANUFACTURING PLATED FORMED BODY, AND SEMICONDUCTOR DEVICE | JSR株式会社 | 2020-02-27 | — | — | WO | disclosed |
| US-10415011-B2 | Adherend recovery method, adherend recovery apparatus, gas-generating film and resin composition | JSR CORPORATION (JP) | 2019-09-17 | — | — | US | disclosed |
| EP-3040411-B1 | ADHEREND RECOVERY METHOD AND ADHEREND RECOVERY DEVICE | JSR CORP (JP) | 2019-07-03 | — | — | EP | disclosed |
| US-10095110-B2 | Photosensitive resin composition, method for forming resist pattern, and method for producing metallic pattern | JSR CORPORATION (JP) | 2018-10-09 | — | — | US | disclosed |
| US-20170153543-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING METALLIC PATTERN | JSR CORPORATION (JP) | 2017-06-01 | — | — | US | disclosed |
| US-20170127533-A1 | PRODUCTION PROCESS FOR SOLDER ELECTRODE, PRODUCTION PROCESS FOR LAMINATE, LAMINATE AND ELECTRONIC PART | JSR CORPORATION (JP) | 2017-05-04 | — | — | US | disclosed |
| EP-3040411-A1 | ADHEREND RECOVERY METHOD, ADHEREND RECOVERY DEVICE, GAS GENERATION MEMBRANE, AND RESIN COMPOSITION | JSR Corporation (JP) | 2016-07-06 | — | — | EP | disclosed |
| US-20160168532-A1 | ADHEREND RECOVERY METHOD, ADHEREND RECOVERY APPARATUS, GAS-GENERATING FILM AND RESIN COMPOSITION | JSR CORPORATION (JP) | 2016-06-16 | — | — | US | disclosed |
| EP-1840654-B1 | Radiation-sensitive negative resin composition | JSR CORP (JP) | 2013-03-20 | — | — | EP | disclosed |
| EP-1840654-A1 | Radiation-sensitive negative resin composition | JSR Corporation (JP) | 2007-10-03 | — | — | EP | disclosed |