SCHEMBL6277233

SCHEMBL6277233

CCCCCOCC(O)COC(C)COC(C)COC(C)CO

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
USP2 O75604 1/20 0.62
HTT P42858 2/20 0.51
TDP1 Q9NUW8 1/20 0.50
LPAR5 Q9H1C0 3/20 0.49
SPHK1 Q9NYA1 1/20 0.47
CYP1A2 P05177 1/20 0.42
CYP3A4 P08684 1/20 0.42
CYP2C19 P33261 1/20 0.42
PLA2G2C Q5R387 1/20 0.42
HSD17B10 Q99714 1/20 0.40
LPAR1 Q92633 6/20 0.38
LPAR3 Q9UBY5 6/20 0.38
LPAR2 Q9HBW0 3/20 0.38
MEN1 O00255 1/20 0.38
THRB P10828 1/20 0.38
KMT2A Q03164 1/20 0.38
MAPT P10636 1/20 0.38
P2RY10 O00398 1/20 0.36
LPAR6 P43657 2/20 0.36
LPAR4 Q99677 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5268735 0.98 USP2 (0.65) USP2HTTTDP1LPAR5SPHK1
SCHEMBL5268818 0.98 USP2 (0.65) USP2HTTTDP1LPAR5SPHK1
SCHEMBL5268599 0.95 USP2 (0.69) USP2HTTTDP1LPAR5SPHK1
SCHEMBL1576197 0.95 USP2 (0.54) USP2HTTTDP1LPAR5SPHK1
SCHEMBL11436363 0.95 USP2 (0.54) USP2HTTTDP1LPAR5SPHK1
SCHEMBL191722 0.92 USP2 (0.58) USP2HTTTDP1LPAR5SPHK1
SCHEMBL6276347 0.90 TDP1 (0.61) USP2HTTTDP1LPAR5SPHK1
SCHEMBL8017912 0.90 TDP1 (0.61) USP2HTTTDP1LPAR5SPHK1
Methacrylic Acid SCHEMBL11760428 0.87 USP2 (0.51) USP2HTTTDP1LPAR5SPHK1
SCHEMBL11431109 0.86 TDP1 (0.60) USP2HTTTDP1LPAR5SPHK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113039070-B Laminate and method for producing laminate 东洋油墨SC控股株式会社 2023-07-07 CN disclosed
CN-116018364-A Antimicrobial active energy ray-curable coating composition, coating, antimicrobial member, and article 东洋油墨SC控股株式会社 2023-04-25 CN disclosed
WO-2022123838-A1 ANTIMICROBIAL ACTIVE ENERGY RAY CURABLE COATING COMPOSITION, COATING LAYER, ANTIMICROBIAL MEMBER, AND ARTICLE 東洋インキSCホールディングス株式会社 2022-06-16 WO disclosed
EP-0899286-B1 Vinyl-group-containing dendrimer and curable composition TOYO INK MFG CO (JP) 2005-12-28 EP disclosed
EP-1146061-A1 MICHAEL ADDITION TYPE URETHANE-UREA RESIN, PROCESS FOR PRODUCING THE SAME, PRESSURE-SENSITIVE ADHESIVE, PROCESS FOR PRODUCING THE SAME, COATING MATERIAL FOR FORMING INK-RECEIVING LAYER, AND RECORDING MATERIAL Toyo Ink Manufacturing Co. Ltd. (JP) 2001-10-17 EP disclosed
US-6187897-B1 USEFUL IN COATING AND PRINTING; CURABLE BY ANY ONE OF CONVENTIONAL TRIGGERS SUCH AS HEATING, ULTRAVIOLET LIGHT, INFRARED LIGHT, ELECTRON BEAMS AND GAMMA RAYS TOYO INK MANUFACTURING CO., LTD. (JP) 2001-02-13 US disclosed
US-6048953-A CURABLE (METH)ACRYLIC POLYMER OR COPOLYMER WITH AVERAGE MOLECULAR WEIGHT OF 1000 OR LESS TOYO INK MANUFACTURING CO., LTD. (JP) 2000-04-11 US disclosed
EP-0899286-A1 Vinyl-group-containing dendrimer and curable composition TOYO INK MANUFACTURING CO., LTD. (JP) 1999-03-03 EP disclosed
EP-0842960-A1 CURABLE LIQUID RESIN COMPOSITION TOYO INK MANUFACTURING CO., LTD. (JP) 1998-05-20 EP disclosed