SCHEMBL5300899

SCHEMBL5300899

CCCCCCCCCCCN=C(N)N

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 1.00
KMT2A Q03164 2/20 1.00
DHPS P49366 1/20 0.61
PRSS1 P07477 1/20 0.59
PRSS2 P07478 1/20 0.59
PRSS3 P35030 1/20 0.59
CYP1A2 P05177 2/20 0.56
ALOX15 P16050 1/20 0.56
NFKB1 P19838 1/20 0.56
MAOA P21397 1/20 0.56
MAOB P27338 1/20 0.56
LMNA P02545 1/20 0.54
SMN1; SMN2 Q16637 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1796352 1.00 MEN1 (1.00) MEN1KMT2ADHPSPRSS1PRSS2
SCHEMBL5306840 1.00 MEN1 (1.00) MEN1KMT2ADHPSPRSS1PRSS2
SCHEMBL1249219 1.00 MEN1 (1.00) MEN1KMT2ADHPSPRSS1PRSS2
SCHEMBL5597193 1.00 MEN1 (1.00) MEN1KMT2ADHPSPRSS1PRSS2
SCHEMBL4104867 1.00 MEN1 (1.00) MEN1KMT2ADHPSPRSS1PRSS2
SCHEMBL5812638 1.00 MEN1 (1.00) MEN1KMT2ADHPSPRSS1PRSS2
SCHEMBL1138747 1.00 MEN1 (1.00) MEN1KMT2ADHPSPRSS1PRSS2
SCHEMBL261682 1.00 MEN1 (1.00) MEN1KMT2ADHPSPRSS1PRSS2
SCHEMBL1069234 1.00 MEN1 (1.00) MEN1KMT2ADHPSPRSS1PRSS2
SCHEMBL8752675 1.00 MEN1 (1.00) MEN1KMT2ADHPSPRSS1PRSS2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4487826-A EXCELLENT SHELF LIFE AND HEAT SENSITIVITY TOPPAN PRINTING CO., LTD. (JP) 1984-12-11 US claimed
CN-105339340-B Generated base alkaline agent, the alkali reactive composition containing the generated base alkaline agent and production alkali method 富士胶片和光纯药株式会社 2018-10-12 CN disclosed
CN-106414461-B Borate-based generated base alkaline agent and alkali reactive composition containing the generated base alkaline agent 富士胶片和光纯药株式会社 2018-09-11 CN disclosed
CN-107848963-A Alkali-producing agent and/or radical-generating agent having acid resistance, and curable resin composition containing same 和光纯药工业株式会社 2018-03-27 CN disclosed
CN-106414461-A BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR 和光纯药工业株式会社 2017-02-15 CN disclosed
CN-105339340-A Base generator, base-reactive composition containing said base generator, and base generation method WAKO PURE CHEM IND LTD 2016-02-17 CN disclosed
WO-2007006418-A1 IONIC-LIQUID-CONTAINING PRODUCTS FOR DYEING AND/OR BRIGHTENING KERATIN FIBRES HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) 2007-01-18 WO disclosed
EP-0084890-B1 DIAZOTYPE HEAT DEVELOPMENT RECORDING MEDIUM Toppan Printing Co., Ltd. (JP) 1986-05-21 EP disclosed
US-4487826-A EXCELLENT SHELF LIFE AND HEAT SENSITIVITY TOPPAN PRINTING CO., LTD. (JP) 1984-12-11 US disclosed
EP-0084890-A1 Diazotype heat development recording medium Toppan Printing Co., Ltd. (JP) 1983-08-03 EP disclosed