Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 6/20 | 0.63 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.63 |
| ▸ | MEN1 | O00255 | 4/20 | 0.63 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.63 |
| ▸ | POLB | P06746 | 3/20 | 0.63 |
| ▸ | GAA | P10253 | 1/20 | 0.63 |
| ▸ | NPC1 | O15118 | 3/20 | 0.55 |
| ▸ | RAB9A | P51151 | 3/20 | 0.55 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.55 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.55 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.55 |
| ▸ | HPGD | P15428 | 1/20 | 0.55 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.55 |
| ▸ | MAOA | P21397 | 2/20 | 0.51 |
| ▸ | MAOB | P27338 | 2/20 | 0.51 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.47 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.47 |
| ▸ | HCRTR1 | O43613 | 1/20 | 0.45 |
| ▸ | LMNA | P02545 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29402827 | 1.00 | MAPT (0.63) | MAPTALDH1A1MEN1KMT2APOLB | |
| SCHEMBL30278834 | 0.85 | GPR3 (0.50) | MAPTALDH1A1MEN1KMT2APOLB | |
| SCHEMBL421647 | 0.85 | GPR3 (0.50) | MAPTALDH1A1MEN1KMT2APOLB | |
| SCHEMBL27558764 | 0.83 | MAPT (0.64) | MAPTALDH1A1MEN1KMT2APOLB | |
| SCHEMBL28311473 | 0.83 | MAPT (0.52) | MAPTALDH1A1MEN1KMT2APOLB | |
| SCHEMBL31379948 | 0.82 | MAPT (0.58) | MAPTALDH1A1MEN1KMT2APOLB | |
| SCHEMBL425780 | 0.82 | MAPT (0.58) | MAPTALDH1A1MEN1KMT2APOLB | |
| SCHEMBL21206936 | 0.82 | MAPT (0.55) | MAPTALDH1A1MEN1KMT2APOLB | |
| SCHEMBL26194399 | 0.81 | MAPT (0.75) | MAPTALDH1A1MEN1KMT2APOLB | |
| SCHEMBL22161850 | 0.81 | NPC1 (0.74) | MAPTALDH1A1MEN1KMT2APOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1453 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122080620-A | Low-shrinkage photo-curing elastic resin composition based on synergistic compensation and application thereof | — | 2026-05-26 | — | — | CN | claimed |
| CN-119264336-A | Polybutadiene acrylate photosensitive resin composition with self-healing property and application thereof in 405nm photocuring 3D printing | 福建农林大学 | 2025-01-07 | — | — | CN | claimed |
| CN-118931467-A | High-adhesive-strength and high-water-resistance UV (ultraviolet) glue and preparation method thereof | 河源然生新材料有限公司 | 2024-11-12 | — | — | CN | claimed |
| CN-118459686-A | Photosensitive resin composition based on polybutadiene polyurethane acrylate and application of photosensitive resin composition in 405nm photocuring 3D printing | 泉州师范学院 | 2024-08-09 | — | — | CN | claimed |
| CN-118192169-A | Photo-thermal curing 3D printing photosensitive resin composition and printing method thereof at 405nm | 杭州喜马拉雅信息科技有限公司 | 2024-06-14 | — | — | CN | claimed |
| CN-118126325-A | Low-temperature-cured alkali-soluble photosensitive resin and preparation method thereof | 深圳先进电子材料国际创新研究院 | 2024-06-04 | — | — | CN | claimed |
| CN-117866149-A | Photosensitive resin composition based on ionic liquid and application of photosensitive resin composition in 405nm3D printing | 福州大学 | 2024-04-12 | — | — | CN | claimed |
| CN-117844234-A | Resin composition based on PSS-PEDOT waterborne polyurethane acrylate and application thereof | 泉州师范学院 | 2024-04-09 | — | — | CN | claimed |
| CN-115197375-B | Photosensitive resin composition suitable for 3D printing transparent elastomer and preparation method thereof | 材翼新材料科技(苏州)有限公司 | 2024-04-02 | — | — | CN | claimed |
| CN-117720687-A | Repairable polyurethane photosensitive resin composition and application thereof in 405nm photocuring 3D printing | 泉州师范学院 | 2024-03-19 | — | — | CN | claimed |
| CN-109836537-A | A kind of application based on anacardol photosensitive resin composition and its in 405nm 3D printing | 泉州师范学院 | 2019-06-04 | — | — | CN | claimed |
| CN-104830159-A | Preparation method and application of photo-curing color paste containing graphene | UNIV QINGDAO SCIENCE & TECHNOLOGY | 2015-08-12 | — | — | CN | claimed |
| CN-104817835-A | Photosensitive resin composition and application thereof in three-dimensional printing | FUJIAN MATTER STRUCTURE | 2015-08-05 | — | — | CN | claimed |
| CN-104765251-A | High-toughness photosensitive resin for 3D printing and preparation method thereof. | UNIV QINGDAO SCIENCE & TECHNOLOGY | 2015-07-08 | — | — | CN | claimed |
| US-8003292-B2 | Method for applying a resist layer, uses of adhesive materials, and adhesive materials and resist layer | INFINEON TECHNOLOGIES AG (DE) | 2011-08-23 | — | — | US | claimed |
| US-5637395-A | PHOTOCURABLE RUBBER OR ACRYL-BASED PRESSURE SENSITIVE ADHESIVE; THREE DIMENSIONAL NETWORK | NITTO ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1997-06-10 | — | — | US | claimed |
| EP-0368327-B1 | Light-sensitive composition | FUJI PHOTO FILM CO LTD (JP) | 1995-02-15 | — | — | EP | claimed |
| EP-0157508-B1 | THIN ADHESIVE SHEET FOR USE IN WORKING SEMICONDUCTOR WAFERS | NITTO DENKO CORPORATION (JP) | 1992-07-15 | — | — | EP | claimed |
| EP-0368327-A2 | Light-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 1990-05-16 | — | — | EP | claimed |
| EP-0157508-A2 | Thin adhesive sheet for use in working semiconductor wafers | NITTO DENKO CORPORATION (JP) | 1985-10-09 | — | — | EP | claimed |