SCHEMBL5311513

SCHEMBL5311513

C[SiH](C)O[Si](C)(C)CCCCl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28605714 0.85
SCHEMBL11911710 0.85
SCHEMBL11911718 0.82
SCHEMBL11911714 0.82
SCHEMBL19702986 0.82
SCHEMBL515099 0.79
SCHEMBL5701340 0.78
SCHEMBL47725 0.78
SCHEMBL6424486 0.76
Ammonia Solution, Strong SCHEMBL10884831 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113637166-B Toughened flame-retardant modified bismaleimide resin and application thereof 江南大学 2022-04-26 CN claimed
CN-113637166-A Toughened flame-retardant modified bismaleimide resin and application thereof 江南大学 2021-11-12 CN claimed
CN-113025160-A High-temperature-resistant electromagnetic shielding coating and application thereof 东莞市德聚胶接技术有限公司 2021-06-25 CN claimed
CN-113637166-B Toughened flame-retardant modified bismaleimide resin and application thereof 江南大学 2022-04-26 CN disclosed
CN-113025160-B High-temperature-resistant electromagnetic shielding coating and application thereof 东莞市德聚胶接技术有限公司 2021-11-23 CN disclosed
CN-113637166-A Toughened flame-retardant modified bismaleimide resin and application thereof 江南大学 2021-11-12 CN disclosed
CN-113292591-A Synthesis method and application of 1, 3-bis (isocyanatoalkyl) -1,1,3, 3-tetramethyldisiloxane 唐山三孚新材料有限公司 2021-08-24 CN disclosed
CN-113025160-A High-temperature-resistant electromagnetic shielding coating and application thereof 东莞市德聚胶接技术有限公司 2021-06-25 CN disclosed
WO-2020025144-A1 PROCESS FOR PRODUCING ORGANOSILOXANES COMPRISING TRIORGANOSILYLOXY GROUPS WACKER CHEMIE AG (DE) 2020-02-06 WO disclosed
WO-2018033199-A1 METHOD FOR THE PRODUCTION OF SECONDARY AMINOORGANOSILICON COMPOUNDS WACKER CHEMIE AG (DE) 2018-02-22 WO disclosed
US-20090270590-A1 Surface Modified Inorganic Material and Producing Method Thereof INDUSTRY-ACADEMIC COOPERATION FOUNDATION YONSEI UNIVERSITY (KR) 2009-10-29 US disclosed
US-7307178-B2 Processes of making γ,δ-unsaturated carboxylic acid and silyl ester thereof, carboxyl group-containing organosilicon compound and process of making SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-12-11 US disclosed
EP-1471069-B1 Preparation of silyl ketene acetals and disilyl ketene acetals SHINETSU CHEMICAL CO (JP) 2007-04-18 EP disclosed
US-7112710-B2 Preparation of silyl ketene acetal and disilyl ketene acetal SHIN-ETSU CHEMICAL CO., LTD. (JP) 2006-09-26 US disclosed
US-20050256329-A1 Preparation of silyl ketene acetal and disilyl ketene acetal KIYOMORI AYUMU 2005-11-17 US disclosed
US-6960679-B2 Preparation of silyl ketene acetal and disilyl ketene acetal SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-11-01 US disclosed
US-20050070729-A1 Processes of making gamma,delta-unsaturated carboxylic acid and silyl ester thereof, carboxyl group-containing organosilicon compound and process of making SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-03-31 US disclosed
US-20040215033-A1 Preparation of silyl ketene acetal and disilyl ketene acetal SHIN-ETSU CHEMICAL CO. LTD. (JP) 2004-10-28 US disclosed
EP-1471069-A1 Preparation of silyl ketene acetals and disilyl ketene acetals SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-10-27 EP disclosed
US-6297340-B1 WITHOUT ADDING ANY OXYGEN, AND TO REDUCE THE DANGER OF FIRE OREXPLOSION, REACTING AROMATIC VINYL COMPOUNDS OR ALLYL HALIDES WITH A SILICON COMPOUND HAVING HYDROSILYL GROUPS IN PRESENCE OF A CARBOXYLIC ACID, A SILYL ESTER OF A SULFONIC DOW CORNING ASIA, LTD. (JP) 2001-10-02 US disclosed