SCHEMBL5316495

SCHEMBL5316495

C=CN(C)C(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Butane SCHEMBL1536067 0.89 TSHR (0.35)
Hexane SCHEMBL1535988 0.85 AKR1B1 (0.41)
SCHEMBL4196069 0.78 ALDH1A1 (0.37)
Acetic Acid SCHEMBL7555401 0.77 FFAR3 (0.39)
SCHEMBL6798885 0.77
SCHEMBL35307 0.75
SCHEMBL5933335 0.75
SCHEMBL1250524 0.73
SCHEMBL3907617 0.73
SCHEMBL9843423 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2952527-B1 ACRYLATE-STYRENE-ACRYLONITRILE POLYMER AND THERMOPLASTIC RESIN COMPOSITION LG CHEMICAL LTD (KR) 2017-05-24 EP claimed
US-12522739-B2 Ink composition DNP FINE CHEMICALS CO., LTD. (JP) 2026-01-13 US disclosed
US-12503614-B2 Resin emulsion for water-based ink NIPPON SHOKUBAI CO., LTD. (JP) 2025-12-23 US disclosed
US-12473448-B2 Recording method, and ink composition used in recording method DNP FINE CHEMICALS CO., LTD. (JP) 2025-11-18 US disclosed
EP-3950964-B1 INK COMPOSITION, INK JET RECORDING METHOD USING SAME, AND METHOD FOR PRODUCING PRINTED MATTER DNP FINE CHEMICALS CO LTD (JP) 2025-08-13 EP disclosed
CN-114945638-B Resin emulsion for water-based ink 株式会社日本触媒 2025-01-07 CN disclosed
EP-4353483-A1 INK COMPOSITION, INK SET, RECORDED MATTER, RECORDING METHOD, AND METHOD FOR PRODUCING RECORDED MATTER DNP Fine Chemicals Co., Ltd. (JP) 2024-04-17 EP disclosed
US-20230392031-A1 INK COMPOSITION DNP FINE CHEMICALS CO., LTD. (JP) 2023-12-07 US disclosed
US-20230340287-A1 RECORDING METHOD, AND INK COMPOSITION USED IN RECORDING METHOD DNP FINE CHEMICALS CO., LTD. (JP) 2023-10-26 US disclosed
EP-4238770-A1 INK COMPOSITION DNP Fine Chemicals Co., Ltd. (JP) 2023-09-06 EP disclosed
EP-1178080-B1 Curable resin coating composition NIPPON CATALYTIC CHEM IND (JP) 2007-04-25 EP disclosed
WO-2007026949-A1 EMULSION TYPE RESIN COMPOSITION NIPPON SHOKUBAI CO., LTD. (JP) 2007-03-08 WO disclosed
WO-2006090917-A2 ULTRAVIOLET ABSORBING POLYMER FOR HIGH LIGHT RESISTANT RECORDING MATERIALS NIPPON SHOKUBAI CO., LTD. (JP) 2006-08-31 WO disclosed
US-20060088786-A1 Rewritable optical information recording medium, recording and reproducing methods, as well as recording and reproducing apparatus MITSUI CHEMICALS, INC. (JP) 2006-04-27 US disclosed
EP-1484191-A1 REWRITABLE OPTICAL INFORMATION RECORDING MEDIUM AND RECORDING/REPRODUCING METHOD, RECORDING/REPRODUCING DEVICE Sony Corporation (JP) 2004-12-08 EP disclosed
US-6713551-B2 POLYOL COMPRISING A HYDROXYL-CONTAINING UNSATURATED MONOMER SUCH AS 2-HYDROXYETHYL ACRYLATE, A RING-CONTAINING UNSATURATED MONOMER SUCH AS CYCLOHEXYL ACRYLATE, A POLYETHER POLYOL, AND A SOLVENT; CURABLE WITH ISOCYANATES; POT LIFE NIPPON SHOKUBAI CO., LTD. (JP) 2004-03-30 US disclosed
US-20020040094-A1 Resin composition for coating and coating composition for curing NIPPON SHOKUBAI CO., LTD. (JP) 2002-04-04 US disclosed
EP-1178080-A2 Curable resin coating composition Nippon Shokubai Co., Ltd. (JP) 2002-02-06 EP disclosed
EP-0055359-B1 PROCESS FOR THE PREPARATION OF 1-ALKENYL ISOCYANATES BASF Aktiengesellschaft (DE) 1983-08-24 EP disclosed
EP-0055359-A1 Process for the preparation of 1-alkenyl isocyanates BASF Aktiengesellschaft (DE) 1982-07-07 EP disclosed