SCHEMBL532790

SCHEMBL532790

CC(C)(C)c1ccc([I+]c2ccc(C(C)(C)C)cc2)cc1.c1ccc([B-](c2ccccc2)(c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.37
KDM1A O60341 1/20 0.36
LMNA P02545 2/20 0.35
TYR P14679 1/20 0.35
MAPT P10636 2/20 0.35
L3MBTL1 Q9Y468 2/20 0.35
TDP1 Q9NUW8 1/20 0.35
KIF11 P52732 1/20 0.34
RAB9A P51151 5/20 0.33
ALDH1A1 P00352 4/20 0.33
SLC22A2 O15244 1/20 0.33
SLC22A1 O15245 1/20 0.33
SLC22A3 O75751 1/20 0.33
KCNK9 Q9NPC2 1/20 0.33
TNKS O95271 1/20 0.33
TNKS2 Q9H2K2 1/20 0.33
PARP3 Q9Y6F1 1/20 0.33
SRD5A2 P31213 1/20 0.32
ABCG2 Q9UNQ0 1/20 0.32
NPC1 O15118 3/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30445784 0.98 KDM1A (0.39) TSHRKDM1ALMNATYRMAPT
SCHEMBL29566113 0.89 MAPT (0.42) LMNAMAPTL3MBTL1TDP1KIF11
SCHEMBL425907 0.86 KDM1A (0.45) TSHRKDM1ALMNATYRMAPT
Hydrochloric Acid SCHEMBL5360882 0.84 KDM1A (0.44) TSHRKDM1ALMNATYRMAPT
SCHEMBL1002888 0.82 KDM1A (0.41) TSHRKDM1ALMNATYRMAPT
SCHEMBL30540411 0.82 KDM1A (0.41) TSHRKDM1ALMNATYRMAPT
SCHEMBL30540408 0.82 KDM1A (0.41) TSHRKDM1ALMNATYRMAPT
SCHEMBL1002886 0.82 KDM1A (0.41) TSHRKDM1ALMNATYRMAPT
SCHEMBL70734 0.81 TSHR (0.52) TSHRLMNATYRMAPTTDP1
SCHEMBL12762156 0.81 TSHR (0.52) TSHRLMNATYRMAPTTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 409 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4563614-A1 CURABLE COMPOSITION COMPRISING A MULTIFUNCTIONAL HALOGENATED THIOXANTHONE AND ITS USES ARKEMA FRANCE (FR) 2025-06-04 EP claimed
EP-2021873-B1 NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS EASTMAN KODAK CO (US) 2013-03-27 EP claimed
US-20110003123-A1 SENSITIZER/INITIATOR COMBINATION FOR NEGATIVE-WORKING THERMAL-SENSITIVE COMPOSITIONS USABLE FOR LITHOGRAPHIC PLATES KODAK GRAPHIC COMMUNICATIONS, GMBH (DE) 2011-01-06 US claimed
EP-2098367-A1 Sensitizer/Initiator Combination for Negative-Working Thermal-Sensitive Compositions Usable for Lithographic Plates EASTMAN KODAK COMPANY (US) 2009-09-09 EP claimed
US-7524614-B2 Negative-working radiation-sensitive compositions and imageable materials EASTMAN KODAK COMPANY (US) 2009-04-28 US claimed
EP-2021873-A1 NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS EASTMAN KODAK COMPANY (US) 2009-02-11 EP claimed
WO-2007139687-A1 NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS EASTMAN KODAK COMPANY (US) 2007-12-06 WO claimed
US-20070275322-A1 Negative-working radiation-sensitive compositions and imageable materials EASTMAN KODAK COMPANY 2007-11-29 US claimed
EP-4725976-A1 POLYMERIC CYCLOALIPHATIC EPOXIDES ARKEMA FRANCE (FR) 2026-04-15 EP disclosed
US-12517430-B2 Lithographic printing plate precursor ECO3 BV (BE) 2026-01-06 US disclosed
US-12487526-B2 Lithographic printing plate precursor ECO3 BV (BE) 2025-12-02 US disclosed
US-12403686-B2 Lithographic printing plate precursor ECO3 BV (BE) 2025-09-02 US disclosed
EP-4171958-B1 LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD FOR MAKING A PRINTING PLATE PRECURSOR AND METHOD FOR MAKING A PRINTING PLATE ECO3 BV (BE) 2025-08-13 EP disclosed
EP-3960455-B1 A LITHOGRAPHIC PRINTING PLATE PRECURSOR, A METHOD FOR MAKING A LITHOGRAPHIC PRINTING PLATE PRECURSOR AND A METHOD FOR MAKING A LITHOGRAPHIC PRINTING PLATE ECO3 BV (BE) 2025-08-06 EP disclosed
US-7332253-B1 Negative-working radiation-sensitive compositions and imageable materials EASTMAN KODAK COMPANY (US) 2008-02-19 US disclosed
US-7326521-B1 Method of imaging and developing negative-working elements EASTMAN KODAK COMPANY (US) 2008-02-05 US disclosed
US-20070275322-A1 Negative-working radiation-sensitive compositions and imageable materials EASTMAN KODAK COMPANY 2007-11-29 US disclosed
US-7175969-B1 Method of preparing negative-working radiation-sensitive elements EASTMAN KODAK COMPANY (US) 2007-02-13 US disclosed
US-20060269874-A1 On-press developable negative-working imageable elements KODAK POLYCHROME GRAPHICS LLC 2006-11-30 US disclosed
US-5587224-A COATING COMPRISES PHOTOLYSIS REACTION PRODUCT OF CHARGE TRANSPORTING POLYMER AND PHOTO ACID COMPOUND XEROX CORPORATION (US) 1996-12-24 US disclosed