Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.52 |
| ▸ | LMNA | P02545 | 1/20 | 0.50 |
| ▸ | TYR | P14679 | 1/20 | 0.50 |
| ▸ | SLC22A2 | O15244 | 1/20 | 0.44 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.44 |
| ▸ | SLC22A3 | O75751 | 1/20 | 0.44 |
| ▸ | KIF11 | P52732 | 2/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.41 |
| ▸ | HPGD | P15428 | 2/20 | 0.39 |
| ▸ | NPC1 | O15118 | 2/20 | 0.39 |
| ▸ | RAB9A | P51151 | 2/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.39 |
| ▸ | BCHE | P06276 | 3/20 | 0.39 |
| ▸ | ACHE | P22303 | 3/20 | 0.39 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12762156 | 1.00 | TSHR (0.52) | TSHRLMNATYRSLC22A2SLC22A1 | |
| Water SCHEMBL515827 | 0.97 | TSHR (0.50) | TSHRLMNATYRSLC22A2SLC22A1 | |
| Iodide SCHEMBL2968443 | 0.97 | TSHR (0.50) | TSHRLMNATYRSLC22A2SLC22A1 | |
| Hydrochloric Acid SCHEMBL217655 | 0.97 | TSHR (0.50) | TSHRLMNATYRSLC22A2SLC22A1 | |
| Bromide SCHEMBL10810288 | 0.97 | TSHR (0.50) | TSHRLMNATYRSLC22A2SLC22A1 | |
| SCHEMBL3813161 | 0.90 | TSHR (0.44) | TSHRLMNATYRSLC22A2SLC22A1 | |
| SCHEMBL425907 | 0.90 | KDM1A (0.45) | TSHRLMNATYRSLC22A2SLC22A1 | |
| SCHEMBL4180074 | 0.90 | TSHR (0.71) | TSHRLMNATYRSLC22A2SLC22A1 | |
| Toliodium SCHEMBL5427632 | 0.90 | TSHR (0.71) | TSHRLMNATYRSLC22A2SLC22A1 | |
| SCHEMBL374593 | 0.90 | TSHR (0.44) | TSHRLMNATYRSLC22A2SLC22A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 5048 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4565378-B1 | METHODS FOR PRODUCING OPTICAL EFFECT LAYERS COMPRISING MAGNETIC OR MAGNETIZABLE PIGMENT PARTICLES AND EXHIBITING ONE OR MORE INDICIA | SICPA HOLDING SA (CH) | 2026-05-06 | — | — | EP | claimed |
| EP-4607278-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | Ycchem Co., Ltd. (KR) | 2025-08-27 | — | — | EP | claimed |
| US-12360454-B2 | Stabilized interfaces of inorganic radiation patterning compositions on substrates | INPRIA CORPORATION (US) | 2025-07-15 | — | — | US | claimed |
| US-20250199405-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | YCCHEM CO., LTD. (KR) | 2025-06-19 | — | — | US | claimed |
| EP-4565378-A1 | METHODS FOR PRODUCING OPTICAL EFFECT LAYERS COMPRISING MAGNETIC OR MAGNETIZABLE PIGMENT PARTICLES AND EXHIBITING ONE OR MORE INDICIA | Sicpa Holding SA (CH) | 2025-06-11 | — | — | EP | claimed |
| CN-119998727-A | Chemically amplified positive resist composition for improving pattern profile and enhancing etch resistance | YC化学制品株式会社 | 2025-05-13 | — | — | CN | claimed |
| US-12287574-B2 | Resin composition and flow cells incorporating the same | ILLUMINA, INC. (US) | 2025-04-29 | — | — | US | claimed |
| CN-119677597-A | Method for producing an optical effect layer comprising magnetic or magnetizable pigment particles and exhibiting more than one marking | 锡克拜控股有限公司 | 2025-03-21 | — | — | CN | claimed |
| CN-119613600-A | Star polymer photoresist film-forming resin and preparation method and application thereof | 黄埔绿色先进材料技术研究院 | 2025-03-14 | — | — | CN | claimed |
| US-12187851-B2 | Network polymers and methods of making and using same | THE REGENTS OF THE UNIVERSITY OF COLORADO, A BODY CORPORATE (US) | 2025-01-07 | — | — | US | claimed |
| US-5998099-A | Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material | LUCENT TECHNOLOGIES INC. (US) | 1999-12-07 | — | — | US | claimed |
| EP-0907109-A1 | Process for device fabrication using a radiation-sensitive resist material | LUCENT TECHNOLOGIES INC. (US) | 1999-04-07 | — | — | EP | claimed |
| EP-0542523-B1 | Positive resist material | SHINETSU CHEMICAL CO (JP) | 1999-03-10 | — | — | EP | claimed |
| EP-0778495-A1 | Resist composition with radiation sensitive acid generator | International Business Machines Corporation (US) | 1997-06-11 | — | — | EP | claimed |
| EP-0679951-B1 | Positive resist composition | TOKYO OHKA KOGYO CO LTD (JP) | 1997-01-15 | — | — | EP | claimed |
| WO-1992022856-A1 | PHOTOELECTROGRAPHIC IMAGING WITH A MULTI-ACTIVE ELEMENT CONTAINING NEAR-INFRARED SENSITIZING PIGMENTS | EASTMAN KODAK COMPANY (US) | 1992-12-23 | — | — | WO | claimed |
| EP-0250893-B1 | COLOUR FILTER ELEMENTS | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1992-08-19 | — | — | EP | claimed |
| EP-0250893-A1 | Colour filter elements | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1988-01-07 | — | — | EP | claimed |
| EP-0244704-A2 | Photoelectrographic elements and imaging method | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1987-11-11 | — | — | EP | claimed |
| US-4650734-A | ACID PHOTOGENERATOR | EASTMAN KODAK COMPANY (US) | 1987-03-17 | — | — | US | claimed |