Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.93 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.93 |
| ▸ | AKR1C3 | P42330 | 3/20 | 0.67 |
| ▸ | NAPRT | Q6XQN6 | 2/20 | 0.65 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.65 |
| ▸ | CA12 | O43570 | 1/20 | 0.65 |
| ▸ | CA1 | P00915 | 1/20 | 0.65 |
| ▸ | CA2 | P00918 | 1/20 | 0.65 |
| ▸ | HMGB1 | P09429 | 1/20 | 0.65 |
| ▸ | HPGD | P15428 | 1/20 | 0.65 |
| ▸ | CA4 | P22748 | 1/20 | 0.65 |
| ▸ | CA6 | P23280 | 1/20 | 0.65 |
| ▸ | CA7 | P43166 | 1/20 | 0.65 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.65 |
| ▸ | CA9 | Q16790 | 1/20 | 0.65 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.65 |
| ▸ | MAPT | P10636 | 2/20 | 0.62 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.62 |
| ▸ | POLB | P06746 | 1/20 | 0.59 |
| ▸ | NR4A1 | P22736 | 3/20 | 0.56 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Phthalic Acid SCHEMBL106333 | 1.00 | ALDH1A1 (0.93) | ALDH1A1ALOX15AKR1C3NAPRTKDM4E | |
| Phthalic Acid SCHEMBL1686043 | 0.97 | ALDH1A1 (1.00) | ALDH1A1ALOX15AKR1C3NAPRTKDM4E | |
| Phthalic Acid SCHEMBL5668586 | 0.97 | ALDH1A1 (1.00) | ALDH1A1ALOX15AKR1C3NAPRTKDM4E | |
| Phthalic Acid SCHEMBL8671920 | 0.97 | ALDH1A1 (1.00) | ALDH1A1ALOX15AKR1C3NAPRTKDM4E | |
| Phthalic Acid SCHEMBL4452470 | 0.97 | ALDH1A1 (1.00) | ALDH1A1ALOX15AKR1C3NAPRTKDM4E | |
| Phthalic Acid SCHEMBL146125 | 0.97 | ALDH1A1 (1.00) | ALDH1A1ALOX15AKR1C3NAPRTKDM4E | |
| Phthalic Acid SCHEMBL1808 | 0.97 | ALDH1A1 (1.00) | ALDH1A1ALOX15AKR1C3NAPRTKDM4E | |
| Phthalic Acid SCHEMBL1332278 | 0.97 | ALDH1A1 (1.00) | ALDH1A1ALOX15AKR1C3NAPRTKDM4E | |
| Phthalic Acid SCHEMBL10477086 | 0.97 | ALDH1A1 (1.00) | ALDH1A1ALOX15AKR1C3NAPRTKDM4E | |
| Phthalic Acid SCHEMBL29674820 | 0.97 | ALDH1A1 (1.00) | ALDH1A1ALOX15AKR1C3NAPRTKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3825278-B1 | METHOD FOR PREPARING HIGH-PURITY BISFLUOROSULFONYLIMIDE SALT | SHANGHAI ROLECHEM CO LTD (CN) | 2025-12-17 | — | — | EP | claimed |
| EP-3825278-A1 | METHOD FOR PREPARING HIGH-PURITY BISFLUOROSULFONYLIMIDE SALT | Shanghai Rolechem Co., Ltd. (CN) | 2021-05-26 | — | — | EP | claimed |
| EP-3825278-B1 | METHOD FOR PREPARING HIGH-PURITY BISFLUOROSULFONYLIMIDE SALT | SHANGHAI ROLECHEM CO LTD (CN) | 2025-12-17 | — | — | EP | disclosed |
| CN-110697668-B | Preparation method of high-purity bis (fluorosulfonyl) imide salt | 上海如鲲新材料有限公司 | 2021-08-06 | — | — | CN | disclosed |
| EP-3825278-A1 | METHOD FOR PREPARING HIGH-PURITY BISFLUOROSULFONYLIMIDE SALT | Shanghai Rolechem Co., Ltd. (CN) | 2021-05-26 | — | — | EP | disclosed |
| CN-110697668-A | Preparation method of high-purity bis (fluorosulfonyl) imide salt | 上海如鲲新材料有限公司 | 2020-01-17 | — | — | CN | disclosed |
| US-9174448-B2 | Ink jet recording apparatus and ink jet recording method | CANON KABUSHIKI KAISHA (JP) | 2015-11-03 | — | — | US | disclosed |
| US-9118062-B2 | Anode and method of manufacturing the same, and battery and method of manufacturing the same | SONY CORPORATION (JP) | 2015-08-25 | — | — | US | disclosed |
| US-20150022585-A1 | INK JET RECORDING APPARATUS AND INK JET RECORDING METHOD | CANON KABUSHIKI KAISHA (JP) | 2015-01-22 | — | — | US | disclosed |
| EP-2415843-B1 | Ink, ink cartridge and ink jet recording method | CANON KK (JP) | 2014-09-10 | — | — | EP | disclosed |
| EP-2415843-A1 | Ink, ink cartridge and ink jet recording method | Canon Kabushiki Kaisha (JP) | 2012-02-08 | — | — | EP | disclosed |
| US-6342319-B1 | NONAQUEOUS ELECTROLYTE SECONDARY BATTERY, NEGATIVE ELECTRODE OF CARBON | KABUSHIKI KAISHA TOSHIBA (JP) | 2002-01-29 | — | — | US | disclosed |
| EP-0268765-B1 | RESIN COMPRISING A POLYPHENYLENE SULFIDE/POLYPHENYLENE SULFONE BLOCK COPOLYMER, PROCESS FOR PREPARING THE COPOLYMER AND MOLDED ARTICLE | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1993-04-14 | — | — | EP | disclosed |
| US-5198316-A | Self crosslinking polyimides for protective coatings or relief images with development in alkaline solutions | CIBA-GEIGY CORPORATION (US) | 1993-03-30 | — | — | US | disclosed |
| US-5145940-A | Diamine with sulfonic acid group, protective layers, relief images | CIBA-GEIGY CORPORATION (US) | 1992-09-08 | — | — | US | disclosed |
| US-4960861-A | REACTING POLYHALOAROMATIC WITH SULFIDIZING AGENT; SOLVENTS AND ADDITIVE TO SEPARATE HIGH AND LOW MOLECULA WEIGHT POLYMERS | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1990-10-02 | — | — | US | disclosed |
| US-4960841-A | REACTING A PREPOLYMER WITH A MIXTURE OF A DIHALODIPHENYL-SULFONE OR A HALOGENATED AROMATIC COMPOUND AND A SULFIDIZATION AGENT IN A POLAR SOLVENT | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1990-10-02 | — | — | US | disclosed |
| EP-0268765-A2 | Resin comprising a polyphenylene sulfide/polyphenylene sulfone block copolymer, process for preparing the copolymer and molded article | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1988-06-01 | — | — | EP | disclosed |
| US-4490522-A | REACTING POLYHALOGENATED AROMATIC COMPOUND WITH ALKALI METAL SULFIDE IN PRESENCE OF OXYALKYLENE COMPOUND | DAINIPPON INK & CHEMICALS, INC. (JP) | 1984-12-25 | — | — | US | disclosed |
| US-3943164-A | IMPROVE DYEABILITY OF OLEFIN POLYMERS | PHILLIPS PETROLEUM COMPANY (US) | 1976-03-09 | — | — | US | disclosed |