Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPR84 | Q9NQS5 | 8/20 | 0.59 |
| ▸ | FFAR1 | O14842 | 2/20 | 0.57 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.57 |
| ▸ | PSMD14 | O00487 | 2/20 | 0.50 |
| ▸ | PLA2G1B | P04054 | 2/20 | 0.50 |
| ▸ | MMP2 | P08253 | 2/20 | 0.50 |
| ▸ | ATG4B | Q9Y4P1 | 2/20 | 0.50 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.50 |
| ▸ | RAD52 | P43351 | 1/20 | 0.50 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.50 |
| ▸ | FDPS | P14324 | 3/20 | 0.46 |
| ▸ | SPHK1 | Q9NYA1 | 1/20 | 0.46 |
| ▸ | LMNA | P02545 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9856655 | 1.00 | GPR84 (0.59) | GPR84FFAR1FFAR4PSMD14PLA2G1B | |
| SCHEMBL1869680 | 1.00 | GPR84 (0.59) | GPR84FFAR1FFAR4PSMD14PLA2G1B | |
| SCHEMBL28577980 | 1.00 | GPR84 (0.59) | GPR84FFAR1FFAR4PSMD14PLA2G1B | |
| SCHEMBL29090021 | 1.00 | GPR84 (0.59) | GPR84FFAR1FFAR4PSMD14PLA2G1B | |
| SCHEMBL1875853 | 0.97 | — | — | |
| Benzene SCHEMBL28050653 | 0.93 | GPR84 (0.59) | GPR84FFAR1FFAR4PSMD14PLA2G1B | |
| SCHEMBL1873762 | 0.90 | — | — | |
| SCHEMBL2381697 | 0.90 | — | — | |
| SCHEMBL2381278 | 0.90 | — | — | |
| SCHEMBL23789287 | 0.84 | FFAR1 (0.67) | GPR84FFAR1FFAR4PSMD14PLA2G1B |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 158 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024120763-A1 | LITHOGRAPHIC PRINTING PRESS MAKE-READY METHOD | ECO3 BV (BE) | 2024-06-13 | — | — | WO | disclosed |
| EP-4382306-A1 | LITHOGRAPHIC PRINTING PRESS MAKE-READY METHOD | ECO3 BV (BE) | 2024-06-12 | — | — | EP | disclosed |
| US-20240100820-A1 | Lithographic Printing Press Make-Ready Method | AGFA OFFSET BV (BE) | 2024-03-28 | — | — | US | disclosed |
| EP-4263224-A1 | LITHOGRAPHIC PRINTING PRESS MAKE-READY METHOD | ECO3 BV (BE) | 2023-10-25 | — | — | EP | disclosed |
| US-20230211599-A1 | Lithographic Photopolymer Printing Plate Precursor with Improved Daylight Stability | AGFA OFFSET BV (BE) | 2023-07-06 | — | — | US | disclosed |
| EP-3922462-B1 | LITHOGRAPHIC PHOTOPOLYMER PRINTING PLATE PRECURSOR WITH IMPROVED DAYLIGHT STABILITY | AGFA OFFSET BV (BE) | 2023-03-01 | — | — | EP | disclosed |
| WO-2022128283-A1 | LITHOGRAPHIC PRINTING PRESS MAKE-READY METHOD | AGFA OFFSET BV (BE) | 2022-06-23 | — | — | WO | disclosed |
| US-20220066318-A1 | LITHOGRAPHIC PRINTING PLATE PRECURSOR | ECO3 BV (BE) | 2022-03-03 | — | — | US | disclosed |
| US-20220032602-A1 | ON-PRESS PROCESSING OF A UV OR VIOLET-SENSITIZED LITHOGRAPHIC PRINTING PLATE | ECO3 BV (BE) | 2022-02-03 | — | — | US | disclosed |
| WO-2021249754-A1 | LITHOGRAPHIC PHOTOPOLYMER PRINTING PLATE PRECURSOR WITH IMPROVED DAYLIGHT STABILITY | AGFA OFFSET BV (BE) | 2021-12-16 | — | — | WO | disclosed |
| US-20080070152-A1 | NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS | BANK OF AMERICA, N.A., AS AGENT | 2008-03-20 | — | — | US | disclosed |
| WO-2008027227-A1 | METHOD OF IMAGING AND DEVELOPING NEGATIVE-WORKING ELEMENTS | EASTMAN KODAK COMPANY (US) | 2008-03-06 | — | — | WO | disclosed |
| US-20080044758-A1 | NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS | EASTMAN KODAK COMPANY | 2008-02-21 | — | — | US | disclosed |
| US-20080044767-A1 | NEGATIVE-WORKING IMAGEABLE MATERIALS | KODAK (NEAR EAST) INC. | 2008-02-21 | — | — | US | disclosed |
| US-7332253-B1 | Negative-working radiation-sensitive compositions and imageable materials | EASTMAN KODAK COMPANY (US) | 2008-02-19 | — | — | US | disclosed |
| US-7326521-B1 | Method of imaging and developing negative-working elements | EASTMAN KODAK COMPANY (US) | 2008-02-05 | — | — | US | disclosed |
| WO-2008013766-A1 | NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS | EASTMAN KODAK COMPANY (US) | 2008-01-31 | — | — | WO | disclosed |
| WO-2007139687-A1 | NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS | EASTMAN KODAK COMPANY (US) | 2007-12-06 | — | — | WO | disclosed |
| US-20070275322-A1 | Negative-working radiation-sensitive compositions and imageable materials | EASTMAN KODAK COMPANY | 2007-11-29 | — | — | US | disclosed |
| US-20060269874-A1 | On-press developable negative-working imageable elements | KODAK POLYCHROME GRAPHICS LLC | 2006-11-30 | — | — | US | disclosed |