SCHEMBL5340490

SCHEMBL5340490

CCC(=CC(=Cc1ccccc1)C=C(CCCO)C(=O)O)C(=O)O

nearest known ligand 0.42

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 1/20 0.42
CYP2C9 P11712 1/20 0.42
LMNA P02545 1/20 0.41
TDP1 Q9NUW8 1/20 0.40
AKR1C3 P42330 1/20 0.39
RECQL P46063 1/20 0.38
MEN1 O00255 1/20 0.38
KMT2A Q03164 1/20 0.38
TBXAS1 P24557 2/20 0.37
HTT P42858 1/20 0.37
PPARG P37231 2/20 0.37
ALOX5 P09917 2/20 0.37
PTGES O14684 1/20 0.37
EPHX2 P34913 1/20 0.35
AKR1C1 Q04828 1/20 0.35
MAPT P10636 2/20 0.34
THRB P10828 1/20 0.34
FBP1 P09467 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9785974 0.92 LMNA (0.48) CYP3A4CYP2C9LMNATDP1AKR1C3
SCHEMBL2042270 0.90 LMNA (0.49) CYP3A4CYP2C9LMNATDP1AKR1C3
SCHEMBL5249714 0.85 LMNA (0.53) CYP3A4CYP2C9LMNATDP1AKR1C3
Methacrylic Acid SCHEMBL8443846 0.85 LMNA (0.48) CYP3A4CYP2C9LMNATDP1AKR1C3
SCHEMBL10685052 0.83 TDP1 (0.60) CYP3A4CYP2C9LMNATDP1MEN1
SCHEMBL5163102 0.81 AKR1C3 (0.54) CYP3A4CYP2C9LMNATDP1AKR1C3
SCHEMBL3082168 0.81 LMNA (0.48) CYP3A4CYP2C9LMNATDP1AKR1C3
SCHEMBL26914643 0.80 CYP3A4 (0.58) CYP3A4CYP2C9LMNATDP1AKR1C3
SCHEMBL10783753 0.80 AKR1C3 (0.49) CYP3A4CYP2C9LMNATDP1AKR1C3
SCHEMBL10413188 0.79 LMNA (0.41) CYP3A4CYP2C9LMNATDP1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10754249-B2 Coating compositions for photolithography ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2020-08-25 US disclosed
US-20170285478-A1 COATING COMPOSITIONS FOR PHOTOLITHOGRAPHY ROHM AND HAAS ELECTRONIC MATERIALS LLC 2017-10-05 US disclosed
US-9690199-B2 Coating compositions for photolithography ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2017-06-27 US disclosed
US-20160223911-A1 COATING COMPOSITIONS FOR PHOTOLITHOGRAPHY ROHM & HAAS ELECT MAT (US) 2016-08-04 US disclosed
US-9323154-B2 Coating compositions for photolithography ROHM AND HAAS ELECTRONIC MATERIALS, LLC (US) 2016-04-26 US disclosed
EP-1845416-A2 Coating compositions for photolithography Rohm and Haas Electronic Materials, L.L.C. (US) 2007-10-17 EP disclosed
US-20070238052-A1 Coating compositions for photolithography ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2007-10-11 US disclosed