⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL345482 | 0.62 | — | — | |
| SCHEMBL18979384 | 0.62 | — | — | |
| SCHEMBL4424926 | 0.59 | — | — | |
| SCHEMBL1147812 | 0.59 | — | — | |
| SCHEMBL9343606 | 0.59 | — | — | |
| SCHEMBL29215581 | 0.59 | — | — | |
| SCHEMBL647384 | 0.59 | — | — | |
| SCHEMBL17046120 | 0.59 | — | — | |
| SCHEMBL22207749 | 0.56 | — | — | |
| Methane SCHEMBL4158420 | 0.56 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114269761-B | Novel silyl cyclodisilazane compound and method for producing silicon-containing film using same | DNF有限公司 | 2024-12-10 | — | — | CN | disclosed |
| CN-114318292-A | Method for coating flame-retardant film layer by chemical vapor deposition method | 中储粮成都储藏研究院有限公司 | 2022-04-12 | — | — | CN | disclosed |
| US-7245010-B2 | System and device including a barrier layer | MICRON TECHNOLOGY, INC. (US) | 2007-07-17 | — | — | US | disclosed |
| US-7095088-B2 | System and device including a barrier layer | MICRON TECHNOLOGY, INC. (US) | 2006-08-22 | — | — | US | disclosed |
| US-20060175673-A1 | System and device including a barrier layer | POWELL DON C | 2006-08-10 | — | — | US | disclosed |
| US-20050275044-A1 | System and device including a barrier alayer | MICRON TECHNOLOGY, INC. | 2005-12-15 | — | — | US | disclosed |
| US-20040217476-A1 | System and device including a barrier layer | MICRON TECHNOLOGY, INC. | 2004-11-04 | — | — | US | disclosed |
| US-6774443-B2 | System and device including a barrier layer | MICRON TECHNOLOGY, INC. | 2004-08-10 | — | — | US | disclosed |
| US-6475883-B2 | Method for forming a barrier layer | MICRON TECHNOLOGY, INC. | 2002-11-05 | — | — | US | disclosed |
| US-6410968-B1 | Semiconductor device with barrier layer | MICRON TECHNOLOGY, INC. | 2002-06-25 | — | — | US | disclosed |
| US-20020060348-A1 | System and device including a barrier layer | MICRON SEMICONDUCTOR PRODUCTS, INC. | 2002-05-23 | — | — | US | disclosed |
| US-20020025658-A1 | Method for forming a barrier layer | MICRON SEMICONDUCTOR PRODUCTS, INC. | 2002-02-28 | — | — | US | disclosed |
| EP-0125772-B1 | FIBER REINFORCED GLASS MATRIX COMPOSITES | DOW CORNING CORPORATION (US) | 1988-03-30 | — | — | EP | disclosed |
| US-4631346-A | Silyl carbamates and their use in the preparation of bis (aminoalkyl) disiloxanes | GENERAL ELECTRIC COMPANY (US) | 1986-12-23 | — | — | US | disclosed |
| US-4565885-A | OLEFINIC AMINE WITH A SILAZANE | GENERAL ELECTRIC COMPANY (US) | 1986-01-21 | — | — | US | disclosed |
| EP-0125772-A1 | Fiber reinforced glass matrix composites | DOW CORNING CORPORATION (US) | 1984-11-21 | — | — | EP | disclosed |
| US-4460638-A | IMPREGNATION HIGH MODULUS FIBERS WITH SILAZANE POLYMER DRYING, PRESSING, CURING AND FIRING | DOW CORNING CORPORATION (US) | 1984-07-17 | — | — | US | disclosed |
| US-4312970-A | PYROLYSIS TO SILICON CARBIDE CERAMICS | DOW CORNING CORPORATION (US) | 1982-01-26 | — | — | US | disclosed |