⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5344169 | 0.62 | — | — | |
| SCHEMBL9343606 | 0.59 | — | — | |
| SCHEMBL4424926 | 0.59 | — | — | |
| SCHEMBL647384 | 0.59 | — | — | |
| SCHEMBL1147812 | 0.59 | — | — | |
| SCHEMBL29215581 | 0.59 | — | — | |
| SCHEMBL378744 | 0.58 | — | — | |
| SCHEMBL465105 | 0.58 | — | — | |
| SCHEMBL29472184 | 0.56 | — | — | |
| SCHEMBL22207749 | 0.56 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 512 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024225770-A1 | FLUORODISILAZANE COMPOUND, COMPOSITION COMPRISING SAME FOR DEPOSITING SILICON-CONTAINING THIN FILM, AND METHOD FOR MANUFACTURING SILICON-CONTAINING THIN FILM USING SAME | (주)디엔에프 | 2024-10-31 | — | — | WO | claimed |
| WO-2024074076-A1 | HIGH-FATIGUE-PROPERTY FLUOROSILICONE RUBBER COMPOUND, ANTI-FATIGUE AGENT, AND PREPARATION METHOD THEREFOR | 新元化学(山东)股份有限公司 | 2024-04-11 | — | — | WO | claimed |
| US-11795365-B1 | Methods of forming hydrophobic surfaces for enhancing performance of geothermal operations | HALLIBURTON ENERGY SERVICES, INC. (US) | 2023-10-24 | — | — | US | claimed |
| CN-115403773-B | High-fatigue fluorosilicone rubber compound, anti-fatigue agent and preparation method thereof | 新元化学(山东)股份有限公司 | 2023-09-19 | — | — | CN | claimed |
| US-11578258-B2 | Omniphobic emulsions for mitigating gas condensate banking and methods of making and using same | HALLIBURTON ENERGY SERVICES, INC. (US) | 2023-02-14 | — | — | US | claimed |
| CN-115403773-A | High-fatigue fluorosilicone rubber compound, anti-fatigue agent and preparation method thereof | 新元化学(山东)股份有限公司 | 2022-11-29 | — | — | CN | claimed |
| CN-112480578-B | Cage-type skeleton structure-based polytetrafluoroethylene composite material and preparation method thereof | 山东省科学院新材料研究所 | 2022-03-25 | — | — | CN | claimed |
| US-20210189224-A1 | Omniphobic Emulsions for Mitigating Gas Condensate Banking and Methods of Making and Using Same | HALLIBURTON ENERGY SERVICES, INC. | 2021-06-24 | — | — | US | claimed |
| US-10975292-B2 | Omniphobic emulsions for mitigating gas condensate banking and methods of making and using same | Halliburton Energy Sendees, Inc. (US) | 2021-04-13 | — | — | US | claimed |
| CN-112480578-A | Cage-type skeleton structure-based polytetrafluoroethylene composite material and preparation method thereof | 山东省科学院新材料研究所 | 2021-03-12 | — | — | CN | claimed |
| US-8562781-B2 | Method for treating an optical lens for the edging thereof | ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE) (FR) | 2013-10-22 | — | — | US | claimed |
| US-20110223418-A1 | Method for Treating an Optical Lens for the Edging Thereof | ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE) (FR) | 2011-09-15 | — | — | US | claimed |
| EP-2346957-A2 | METHOD FOR TREATING, BY MEANS OF AN ADHESIVE FILM, AN OPTICAL LENS COMPRISING A DIRT-REPELLANT COATING FOR THE EDGING THEREOF | Essilor International (Compagnie Générale D'Optique) (FR) | 2011-07-27 | — | — | EP | claimed |
| WO-2010055261-A2 | METHOD FOR TREATING, BY MEANS OF AN ADHESIVE FILM, AN OPTICAL LENS COMPRISING A DIRT-REPELLANT COATING FOR THE EDGING THEREOF | ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE) (FR) | 2010-05-20 | — | — | WO | claimed |
| EP-1089874-A4 | LOW $g(k) DIELECTRIC INORGANIC/ORGANIC HYBRID FILMS AND METHOD OF MAKING | SILICON VALLEY GROUP THERMAL (US) | 2004-09-22 | — | — | EP | claimed |
| EP-1089874-A1 | LOW $g(k) DIELECTRIC INORGANIC/ORGANIC HYBRID FILMS AND METHOD OF MAKING | Silicon Valley Group Thermal Systems LLC (US) | 2001-04-11 | — | — | EP | claimed |
| US-6068884-A | DEPOSITING BY CHEMICAL VAPOR DEPOSITION WHERE SAID PRECURSOR REACTS AND DEPOSITS SAID DIELECTRIC FILM ON THE SURFACE OF A SUBSTRATE | SILCON VALLEY GROUP THERMAL SYSTEMS, LLC (US) | 2000-05-30 | — | — | US | claimed |
| WO-1999055526-A1 | LOW λ DIELECTRIC INORGANIC/ORGANIC HYBRID FILMS AND METHOD OF MAKING | SILICON VALLEY GROUP THERMAL SYSTEMS, LLC (US) | 1999-11-04 | — | — | WO | claimed |
| US-5458976-A | Inorganic base powder surface treated with a fluorosilane, fluorosilazane or fluorinated hydrocarbon | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1995-10-17 | — | — | US | claimed |
| US-4355121-A | Heat strength curable silicone rubber compositions | GENERAL ELECTRIC COMPANY (US) | 1982-10-19 | — | — | US | claimed |