⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28017495 | 0.72 | — | — | |
| SCHEMBL2811099 | 0.67 | — | — | |
| SCHEMBL11232620 | 0.67 | — | — | |
| Fluoride SCHEMBL27823400 | 0.64 | — | — | |
| SCHEMBL22319199 | 0.64 | — | — | |
| SCHEMBL28177460 | 0.64 | — | — | |
| SCHEMBL294964 | 0.64 | — | — | |
| Water SCHEMBL11085514 | 0.64 | — | — | |
| SCHEMBL13940791 | 0.64 | — | — | |
| SCHEMBL10613132 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20040033445-A1 | Method of forming a photoresist pattern and method for patterning a layer using a photoresist | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-02-19 | — | — | US | claimed |
| US-7297466-B2 | Method of forming a photoresist pattern and method for patterning a layer using a photoresist | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-11-20 | — | — | US | disclosed |
| US-7109343-B2 | Metal catalysts and methods for making and using same | THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK (US) | 2006-09-19 | — | — | US | disclosed |
| US-20050010049-A1 | Metal catalysts and methods for making and using same | DAVIES HUW M L (US) | 2005-01-13 | — | — | US | disclosed |
| US-6762304-B2 | BIS-TRANSITION METAL CATALYSTS HAVING D2 SYMMETRY | RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK | 2004-07-13 | — | — | US | disclosed |
| EP-1173278-B1 | METAL CATALYSTS AND METHODS FOR MAKING AND USING SAME | RES FOUNDATION OFSTATE UNIVERS (US) | 2004-06-30 | — | — | EP | disclosed |
| US-20040033445-A1 | Method of forming a photoresist pattern and method for patterning a layer using a photoresist | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-02-19 | — | — | US | disclosed |
| US-20020183535-A1 | Metal catalysts and methods for making and using same | DAVIES HUW M L (US) | 2002-12-05 | — | — | US | disclosed |
| US-6410746-B1 | ORGANOMETALLIC COMPOUND CONTAINING TRANSITION METAL | RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK, THE | 2002-06-25 | — | — | US | disclosed |
| EP-1173278-A1 | METAL CATALYSTS AND METHODS FOR MAKING AND USING SAME | THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK (US) | 2002-01-23 | — | — | EP | disclosed |
| WO-2000064583-A1 | METAL CATALYSTS AND METHODS FOR MAKING AND USING SAME | THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK (US) | 2000-11-02 | — | — | WO | disclosed |