⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13346592 | 0.89 | POLB (0.30) | — | |
| SCHEMBL5357417 | 0.89 | — | — | |
| SCHEMBL11622618 | 0.89 | — | — | |
| SCHEMBL13346581 | 0.87 | — | — | |
| SCHEMBL13346597 | 0.85 | CYP19A1 (0.32) | — | |
| SCHEMBL11352619 | 0.85 | — | — | |
| SCHEMBL5369235 | 0.84 | — | — | |
| SCHEMBL13346596 | 0.84 | — | — | |
| SCHEMBL5356046 | 0.80 | ALDH1A1 (0.32) | — | |
| SCHEMBL11620481 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7714087-B2 | Polar group-containing olefin copolymer, process for preparing the same, thermoplastic resin composition containing the copolymer, and uses thereof | MITSUI CHEMICALS, INC. (JP) | 2010-05-11 | — | — | US | disclosed |
| US-20090137757-A1 | Polar group-containing olefin copolymer, process for preparing the same, thermoplastic resin composition containing the copolymer, and uses thereof | IMUTA JUNICHI | 2009-05-28 | — | — | US | disclosed |
| US-7393907-B2 | Polar group-containing olefin copolymer, process for preparing the same, thermoplastic resin composition containing the copolymer, and uses thereof | MITSUI CHEMICALS, INC. (JP) | 2008-07-01 | — | — | US | disclosed |
| US-7202016-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2007-04-10 | — | — | US | disclosed |
| EP-1085379-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2006-01-04 | — | — | EP | disclosed |
| US-20050214680-A1 | Radiation-sensitive resin composition | MIYAJI MASAAKI | 2005-09-29 | — | — | US | disclosed |
| US-6933094-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-08-23 | — | — | US | disclosed |
| US-6623907-B2 | Chemical amplified photoresist | JSR CORPORATION (JP) | 2003-09-23 | — | — | US | disclosed |
| US-6482568-B1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-11-19 | — | — | US | disclosed |
| US-20020058201-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-05-16 | — | — | US | disclosed |
| EP-1193558-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-04-03 | — | — | EP | disclosed |
| US-20010023050-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-09-20 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-1085379-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-03-21 | — | — | EP | disclosed |
| US-4233222-A | Cyclopentylacetic acid derivatives | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1980-11-11 | — | — | US | disclosed |
| US-4210669-A | Prostanoic acid derivatives | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1980-07-01 | — | — | US | disclosed |