SCHEMBL5349969

SCHEMBL5349969

O=S(=O)(O)c1ccc2ccc(S(=O)(=O)O)cc2c1.[NaH].[NaH]

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 5/20 0.57
▸ HSD17B10 Q99714 4/20 0.57
▸ CASP6 P55212 3/20 0.57
▸ CYP2C9 P11712 1/20 0.57
▸ CYP2C19 P33261 1/20 0.57
▸ SNCA P37840 2/20 0.53
▸ NT5E P21589 4/20 0.48
▸ LMNA P02545 2/20 0.48
▸ TSHR P16473 3/20 0.46
▸ TDP1 Q9NUW8 2/20 0.45
▸ NSD2 O96028 2/20 0.44
▸ DUSP3 P51452 1/20 0.44
▸ PTPN5 P54829 1/20 0.44
▸ PTPN11 Q06124 1/20 0.44
▸ SMN1; SMN2 Q16637 1/20 0.44
▸ KDM4E B2RXH2 1/20 0.44
▸ HPGD P15428 1/20 0.44
▸ CA12 O43570 1/20 0.42
▸ CA1 P00915 1/20 0.42
▸ CA2 P00918 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3822707 1.00 ALDH1A1 (0.57) ALDH1A1HSD17B10CASP6CYP2C9CYP2C19
SCHEMBL28501502 1.00 ALDH1A1 (0.57) ALDH1A1HSD17B10CASP6CYP2C9CYP2C19
SCHEMBL29574227 0.97 ALDH1A1 (0.59) ALDH1A1HSD17B10CASP6CYP2C9CYP2C19
SCHEMBL822307 0.97 ALDH1A1 (0.59) ALDH1A1HSD17B10CASP6CYP2C9CYP2C19
SCHEMBL29381755 0.97 ALDH1A1 (0.59) ALDH1A1HSD17B10CASP6CYP2C9CYP2C19
Hydrochloric Acid SCHEMBL11162227 0.95 ALDH1A1 (0.57) ALDH1A1HSD17B10CASP6CYP2C9CYP2C19
SCHEMBL11774462 0.95 ALDH1A1 (0.57) ALDH1A1HSD17B10CASP6CYP2C9CYP2C19
SCHEMBL3819763 0.95 ALDH1A1 (0.57) ALDH1A1HSD17B10CASP6CYP2C9CYP2C19
SCHEMBL3825262 0.95 ALDH1A1 (0.57) ALDH1A1HSD17B10CASP6CYP2C9CYP2C19
Ammonia Solution, Strong SCHEMBL10613938 0.95 ALDH1A1 (0.57) ALDH1A1HSD17B10CASP6CYP2C9CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109251320-B Polyion liquid with ionic bond as framework and preparation method thereof 东华大学 2021-07-16 — — CN claimed
CN-115433110-A Method for preparing 2, 7-sodium naphthalenedisulfonate by recycling naphthol-containing wastewater 安徽生源化工有限公司 2022-12-06 — — CN disclosed
CN-115433110-A Method for preparing 2, 7-sodium naphthalenedisulfonate by recycling naphthol-containing wastewater 安徽生源化工有限公司 2022-12-06 — — CN disclosed
CN-105705221-B Water treatment separation membrane comprising ion-exchangeable polymer layer and method of forming the same 株式会社LG化学 2018-09-14 — — CN disclosed
CN-103097428-B Triblock copolymer and dielectric film prepared therefrom LG化学株式会社 2016-11-23 — — CN disclosed
CN-102213725-B Preparation of a red blood cell component for a hematology control BIO RAD LABORATORIES 2015-01-21 — — CN disclosed
CN-101861350-B Polysulfone polymers and membranes for reverse osmosis, nanofiltration and ultrafiltration TECHNION RES & DEV FOUNDATION 2014-09-10 — — CN disclosed
CN-102168266-B Circuit board browning liquid suitable for high-temperature halogen-free board DONGGUAN FUMOKE CHEMICAL CO LTD 2013-01-23 — — CN disclosed
CN-102168266-A Circuit board browning liquid suitable for high-temperature halogen-free board DONGGUAN FUMOKE CHEMICAL CO LTD 2011-08-31 — — CN disclosed
CN-101861350-A Polysulfone polymers and membranes for reverse osmosis, nanofiltration and ultrafiltration TECHNION RES & DEV FOUNDATION 2010-10-13 — — CN disclosed
CN-101412686-A Method for preparing 2,7-naphthalenedisulfonate with reaction mother liquor for producing 1,6-naphthalene disulfonic acid UNIV YANGZHOU (CN) 2009-04-22 — — CN disclosed
CN-101412685-A Method for preparing 2,7-naphthalenedisulfonate with reaction mother liquor for producing 1,5-naphthalene disulfonic acid UNIV YANGZHOU (CN) 2009-04-22 — — CN disclosed
US-7303616-B2 Ink composition, ink jet recording method and recorded article SEIKO EPSON CORPORATION (JP) 2007-12-04 — — US disclosed
CN-100340620-C Ink composition, method of ink-jet recording, and print SEIKO EPSON CORP (JP) 2007-10-03 — — CN disclosed
US-20060135646-A1 Ink composition, ink jet recording method and recorded article SEIKO EPSON CORPORATION (JP) 2006-06-22 — — US disclosed
CN-1717458-A Ink composition, ink jet recording method and recorded matter SEIKO EPSON CORP (JP) 2006-01-04 — — CN disclosed
CN-1569618-A Process for preparing hydrogen sulfide TANG PEIKUN (CN) 2005-01-26 — — CN disclosed
CN-1155479-C Ink jetting recording material 王子制纸株式会社 2004-06-30 — — CN disclosed
CN-1264650-A Ink jetting recording material PRINCE PAPER MAKING CO LTD (JP) 2000-08-30 — — CN disclosed
CN-1030680-C Fly attracting composition EARTH CHEMICAL CO (JP) 1996-01-17 — — CN disclosed
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