Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.53 |
| ▸ | LMNA | P02545 | 1/20 | 0.53 |
| ▸ | THRB | P10828 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.37 |
| ▸ | HPGD | P15428 | 1/20 | 0.35 |
| ▸ | EPHX2 | P34913 | 3/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.34 |
| ▸ | POLB | P06746 | 2/20 | 0.34 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.32 |
| ▸ | APEX1 | P27695 | 1/20 | 0.32 |
| ▸ | RECQL | P46063 | 1/20 | 0.32 |
| ▸ | BLM | P54132 | 1/20 | 0.32 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22264029 | 0.82 | KDM4E (0.51) | KDM4ELMNATHRBALDH1A1HPGD | |
| SCHEMBL5358926 | 0.79 | KDM4E (0.49) | KDM4ELMNATHRBALDH1A1HPGD | |
| SCHEMBL5351980 | 0.79 | KDM4E (0.49) | KDM4ELMNATHRBALDH1A1HPGD | |
| SCHEMBL14822849 | 0.77 | KDM4E (0.59) | KDM4ELMNATHRBALDH1A1HPGD | |
| SCHEMBL301403 | 0.77 | KDM4E (0.59) | KDM4ELMNATHRBALDH1A1HPGD | |
| SCHEMBL11689296 | 0.77 | KDM4E (0.59) | KDM4ELMNATHRBALDH1A1HPGD | |
| SCHEMBL5352602 | 0.77 | KDM4E (0.50) | KDM4ELMNATHRBALDH1A1HPGD | |
| SCHEMBL22263900 | 0.77 | KDM4E (0.42) | KDM4ELMNATHRBALDH1A1HPGD | |
| SCHEMBL5892403 | 0.76 | KDM4E (0.63) | KDM4ELMNATHRBALDH1A1HPGD | |
| SCHEMBL11706641 | 0.76 | KDM4E (0.49) | KDM4ELMNATHRBALDH1A1HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4250063-A | COORDINATION CATALYST COMPRISING AN ORGANIC COMPLEX OF TUNGSTEN OR MOLYBDENUM, A TITANIUM TETRAHALIDE, AND AN N-HALO IMIDE, A SULFIDE, A SULFOXIDE, OR A PHOSPHINE; POLYALKENAMERS | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1981-02-10 | — | — | US | claimed |
| US-4106943-A | RING-OPENED POLYMER OR COPOLYMER OF NORBORNENE DERIVATIVE | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1978-08-15 | — | — | US | claimed |
| US-4011386-A | RING OPENING, POLYALKENAMERS | JAPAN SYNTHETIC RUBBER CO., LTD. (JA) | 1977-03-08 | — | — | US | claimed |
| US-11886119-B2 | Material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate | MITSUI CHEMICALS, INC. (JP) | 2024-01-30 | — | — | US | disclosed |
| US-20230185195-A1 | MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE | MITSUI CHEMICALS, INC. (JP) | 2023-06-15 | — | — | US | disclosed |
| US-11599025-B2 | Resin material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate | MITSUI CHEMICALS, INC. (JP) | 2023-03-07 | — | — | US | disclosed |
| US-20200264511-A1 | MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE | MITSUI CHEMICALS, INC. (JP) | 2020-08-20 | — | — | US | disclosed |
| EP-3693793-A1 | RESIN MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR PRODUCING RESIST UNDERLAYER FILM, AND LAYERED PRODUCT | Mitsui Chemicals, Inc. (JP) | 2020-08-12 | — | — | EP | disclosed |
| US-20200241419-A1 | RESIN MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE | MITSUI CHEMICALS, INC. (JP) | 2020-07-30 | — | — | US | disclosed |
| CN-111183395-A | Resin material for forming underlayer film, resist underlayer film, method for producing resist underlayer film, and laminate | 三井化学株式会社 | 2020-05-19 | — | — | CN | disclosed |
| CN-110709774-A | Material for forming underlayer film, resist underlayer film, method for producing resist underlayer film, and laminate | 三井化学株式会社 | 2020-01-17 | — | — | CN | disclosed |
| US-6933094-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-08-23 | — | — | US | disclosed |
| JP-2002202604-A | RADIATION SENSITIVE RESIN COMPOSITION | JSR CORP | 2002-07-19 | — | — | JP | disclosed |
| US-20020058201-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-05-16 | — | — | US | disclosed |
| EP-1193558-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-04-03 | — | — | EP | disclosed |
| US-4250063-A | COORDINATION CATALYST COMPRISING AN ORGANIC COMPLEX OF TUNGSTEN OR MOLYBDENUM, A TITANIUM TETRAHALIDE, AND AN N-HALO IMIDE, A SULFIDE, A SULFOXIDE, OR A PHOSPHINE; POLYALKENAMERS | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1981-02-10 | — | — | US | disclosed |
| US-4176220-A | COORDINATION CATALYST | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1979-11-27 | — | — | US | disclosed |
| US-4106943-A | RING-OPENED POLYMER OR COPOLYMER OF NORBORNENE DERIVATIVE | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1978-08-15 | — | — | US | disclosed |
| US-4068063-A | Catalyst composition for ring-opening polymerization of norbornene derivatives and process for polymerizing same | JAPAN SYNTHETIC RUBBER CO., LTD. (JA) | 1978-01-10 | — | — | US | disclosed |
| US-4011386-A | RING OPENING, POLYALKENAMERS | JAPAN SYNTHETIC RUBBER CO., LTD. (JA) | 1977-03-08 | — | — | US | disclosed |