SCHEMBL5358883

SCHEMBL5358883

C=CC(=O)OCCCCCCCCCCN=C=O

nearest known ligand 0.66

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.66
ALDH1A1 P00352 4/20 0.66
CYP3A4 P08684 2/20 0.66
HPGD P15428 1/20 0.50
TP53 P04637 3/20 0.46
HIF1A Q16665 3/20 0.46
HSD17B10 Q99714 1/20 0.46
THRB P10828 2/20 0.36
MAPK1 P28482 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
HCAR2 Q8TDS4 2/20 0.34
ATM Q13315 1/20 0.32
TRPA1 O75762 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10599659 1.00 TSHR (0.66) TSHRALDH1A1CYP3A4HPGDTP53
SCHEMBL22609056 1.00 TSHR (0.66) TSHRALDH1A1CYP3A4HPGDTP53
SCHEMBL5358179 1.00 TSHR (0.66) TSHRALDH1A1CYP3A4HPGDTP53
SCHEMBL1854743 1.00 TSHR (0.66) TSHRALDH1A1CYP3A4HPGDTP53
SCHEMBL1701307 1.00 TSHR (0.66) TSHRALDH1A1CYP3A4HPGDTP53
SCHEMBL321467 1.00 TSHR (0.66) TSHRALDH1A1CYP3A4HPGDTP53
SCHEMBL5350736 1.00 TSHR (0.66) TSHRALDH1A1CYP3A4HPGDTP53
SCHEMBL321389 0.98 TSHR (0.62) TSHRALDH1A1CYP3A4HPGDTP53
SCHEMBL321508 0.93 TSHR (0.59) TSHRALDH1A1CYP3A4HPGDTP53
SCHEMBL11533427 0.91 TSHR (0.58) TSHRALDH1A1CYP3A4HPGDTP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250277073-A1 CURABLE COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING LAMINATE FUJIFILM CORPORATION (JP) 2025-09-04 US disclosed
US-12180136-B2 Organic amine collection method ASAHI KASEL KABUSHIKI KAISHA (JP) 2024-12-31 US disclosed
US-20240425448-A1 METHOD FOR PRODUCING ISOCYANATE COMPOUND, METHOD FOR PRODUCING CARBAMATE COMPOUND, METHOD FOR RECOVERING AMINE COMPOUND, AND ISOCYANATE COMPOSITION ASAHI KASEI KABUSHIKI KAISHA (JP) 2024-12-26 US disclosed
EP-4431490-A1 METHOD FOR PRODUCING ISOCYANATE COMPOUNDS, METHOD FOR PRODUCING CARBAMATE COMPOUNDS, METHOD FOR RECOVERING AMINE COMPOUNDS, AND ISOCYANATE COMPOSITION Asahi Kasei Kabushiki Kaisha (JP) 2024-09-18 EP disclosed
EP-4431491-A1 CARBONYL COMPOUND, METHOD FOR PRODUCING CARBONYL COMPOUND, METHOD FOR PRODUCING ISOCYANATE COMPOUND, AND ISOCYANATE COMPOSITION Asahi Kasei Kabushiki Kaisha (JP) 2024-09-18 EP disclosed
CN-118302407-A Carbonyl compound, method for producing isocyanate compound, and isocyanate composition 旭化成株式会社 2024-07-05 CN disclosed
WO-2024128086-A1 CURABLE COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING LAMINATE 富士フイルム株式会社 2024-06-20 WO disclosed
CN-118215651-A Method for producing isocyanate compound, method for producing urethane compound, method for recovering amine compound, and isocyanate composition 旭化成株式会社 2024-06-18 CN disclosed
EP-3940005-B1 CURABLE RESIN COMPOSITION AND CURED PRODUCT THEREOF SUMITOMO SEIKA CHEMICALS (JP) 2023-10-18 EP disclosed
WO-2023080258-A1 CARBONYL COMPOUND, METHOD FOR PRODUCING CARBONYL COMPOUND, METHOD FOR PRODUCING ISOCYANATE COMPOUND, AND ISOCYANATE COMPOSITION 旭化成株式会社 2023-05-11 WO disclosed
CN-1975573-A Side chain unsaturated polymer, radiation sensitive resin composition and spacer for liquid crystal display element JSR CORP (JP) 2007-06-06 CN disclosed
CN-1765948-A Side chain unsaturated polymer, radiation sensitive resin composition and spacer for liquid crystal display element JSR CORP (JP) 2006-05-03 CN disclosed
US-20050244739-A1 Highly heat-resistant, negative-type photosensitive resin composition ASAHI KASEI EMD CORPORATION (JP) 2005-11-03 US disclosed
EP-1536286-A1 HIGHLY HEAT-RESISTANT, NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION Asahi Kasei EMD Corporation (JP) 2005-06-01 EP disclosed
US-5847071-A Photosensitive resin composition HITACHI, CHEMICAL CO., LTD. (JP) 1998-12-08 US disclosed
US-5668248-A POLYAMIC ACID ESTERS HITACHI CHEMICAL CO., LTD. (JP) 1997-09-16 US disclosed
US-5472823-A Polyamic acids HITACHI CHEMICAL CO., LTD. (JP) 1995-12-05 US disclosed
EP-0373952-B1 Photosensitive resin composition and photosensitive element using the same HITACHI CHEMICAL CO LTD (JP) 1995-02-08 EP disclosed
US-5262277-A Light sensitive elements for electrical thick films with heat resistance HITACHI CHEMICAL COMPANY, INC. (JP) 1993-11-16 US disclosed
EP-0373952-A2 Photosensitive resin composition and photosensitive element using the same Hitachi Chemical Co., Ltd. (JP) 1990-06-20 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12180136-B2 Organic amine collection method H1-0, F12, C1S TSHR 1695/4885ALDH1A1 1007/4885CYP3A4 831/4885
US-20240425448-A1 METHOD FOR PRODUCING ISOCYANATE COMPOUND, METHOD FOR PRODUCING CARBAMATE COMPOUND, METHOD FOR RECOVERING AMINE COMPOUND, AND ISOCYANATE COMPOSITION IDH3A, CA7, C9 TSHR 4594/4885ALDH1A1 630/4885CYP3A4 182/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.