SCHEMBL5360058

SCHEMBL5360058

O=[C]OC1CCC(C(=O)O)CC1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.40
PLG P00747 1/20 0.40
PLAT P00750 1/20 0.40
TSHR P16473 2/20 0.39
GABRP O00591 1/20 0.39
GABRD O14764 1/20 0.39
GABRA1 P14867 1/20 0.39
GABRB1 P18505 1/20 0.39
GABRG2 P18507 1/20 0.39
GABRB3 P28472 1/20 0.39
GABRA5 P31644 1/20 0.39
GABRA3 P34903 1/20 0.39
GABRA2 P47869 1/20 0.39
GABRB2 P47870 1/20 0.39
GABRA4 P48169 1/20 0.39
GABRE P78334 1/20 0.39
PMP22 Q01453 1/20 0.39
GABRA6 Q16445 1/20 0.39
GABRG1 Q8N1C3 1/20 0.39
GABRG3 Q99928 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5353326 0.87 ACE (0.37) LMNAPLGPLATTSHRGABRP
SCHEMBL98196 0.80
SCHEMBL1766635 0.78
SCHEMBL2675608 0.75 LMNA (0.46) LMNAPLGPLATTSHRGABRP
SCHEMBL17802859 0.75 LMNA (0.46) LMNAPLGPLATTSHRGABRP
SCHEMBL36093 0.74 TSHR (0.61) LMNAPLGPLATTSHRGABRP
Cyclopropane Carboxylic Acid SCHEMBL4643 0.74
Cyclopropane Carboxylic Acid SCHEMBL5499291 0.74
Cyclopropane Carboxylic Acid SCHEMBL10800712 0.74
SCHEMBL329128 0.74 TSHR (0.61) LMNAPLGPLATTSHRGABRP

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7202016-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2007-04-10 US disclosed
US-20050214680-A1 Radiation-sensitive resin composition MIYAJI MASAAKI 2005-09-29 US disclosed
US-6933094-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-08-23 US disclosed
US-20020058201-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-05-16 US disclosed
EP-1193558-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2002-04-03 EP disclosed