Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.60 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.52 |
| ▸ | FASN | P49327 | 1/20 | 0.40 |
| ▸ | TRPV1 | Q8NER1 | 2/20 | 0.39 |
| ▸ | FAAH | O00519 | 2/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2577506 | 0.94 | TSHR (0.61) | TSHRALDH1A1FASNTRPV1FAAH | |
| SCHEMBL25185565 | 0.89 | TSHR (0.68) | TSHRALDH1A1FASNTRPV1FAAH | |
| SCHEMBL29284294 | 0.87 | TSHR (0.73) | TSHRALDH1A1FASNTRPV1FAAH | |
| SCHEMBL25186085 | 0.87 | TSHR (0.73) | TSHRALDH1A1FASNTRPV1FAAH | |
| SCHEMBL25171255 | 0.87 | TSHR (0.71) | TSHRALDH1A1FASNTRPV1FAAH | |
| SCHEMBL5152113 | 0.87 | TSHR (0.56) | TSHRALDH1A1FASNTRPV1FAAH | |
| SCHEMBL25172383 | 0.85 | TSHR (0.76) | TSHRALDH1A1FASNTRPV1FAAH | |
| SCHEMBL4731729 | 0.85 | TSHR (0.76) | TSHRALDH1A1FASNTRPV1FAAH | |
| SCHEMBL29576499 | 0.85 | TSHR (0.76) | TSHRALDH1A1FASNTRPV1FAAH | |
| SCHEMBL25182592 | 0.85 | TSHR (0.76) | TSHRALDH1A1FASNTRPV1FAAH |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7163778-B2 | Anti-reflection film material and a substrate having an anti-reflection film and a method for forming a pattern | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-16 | — | — | US | disclosed |
| US-20040191479-A1 | Anti-reflection film material and a substrate having an anti-reflection film and a method for forming a pattern | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-09-30 | — | — | US | disclosed |