SCHEMBL5362386

SCHEMBL5362386

OCCN1CCNCC1.OCCOCCN1CCNCC1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.44
ALDH1A1 P00352 1/20 0.44
TDP1 Q9NUW8 1/20 0.44
MEN1 O00255 3/20 0.43
KMT2A Q03164 3/20 0.43
HTR1A P08908 1/20 0.42
CXCR4 P61073 2/20 0.41
SMN1; SMN2 Q16637 2/20 0.40
SIGMAR1 Q99720 2/20 0.39
TSHR P16473 1/20 0.39
MAPK1 P28482 1/20 0.39
HTR7 P34969 2/20 0.38
POLB P06746 1/20 0.38
HSD17B10 Q99714 1/20 0.38
ABCB11 O95342 1/20 0.38
CHRM2 P08172 1/20 0.38
ADRA2A P08913 1/20 0.38
DRD2 P14416 1/20 0.38
ADRA2B P18089 1/20 0.38
ADRA2C P18825 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL40202 0.96 KDM4E (0.46) KDM4EALDH1A1TDP1MEN1KMT2A
Hydrochloric Acid SCHEMBL4752557 0.94 HTR1A (0.46) KDM4EALDH1A1TDP1MEN1KMT2A
SCHEMBL1276025 0.94 KDM4E (0.48) KDM4EALDH1A1TDP1MEN1KMT2A
SCHEMBL10526522 0.94 KDM4E (0.48) KDM4EALDH1A1TDP1MEN1KMT2A
Piperazine SCHEMBL28261404 0.94 CXCR4 (0.47) KDM4EALDH1A1TDP1MEN1KMT2A
SCHEMBL9667137 0.94 CXCR4 (0.47) KDM4EALDH1A1TDP1MEN1KMT2A
SCHEMBL10526359 0.94 KDM4E (0.48) KDM4EALDH1A1TDP1MEN1KMT2A
Hydrochloric Acid SCHEMBL27959825 0.94 HTR1A (0.46) KDM4EALDH1A1TDP1MEN1KMT2A
Hydrochloric Acid SCHEMBL4754388 0.92 HTR1A (0.45) KDM4EALDH1A1TDP1MEN1KMT2A
Hydrochloric Acid SCHEMBL28362749 0.92 KDM4E (0.47) KDM4EALDH1A1TDP1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7303855-B2 Photoresist undercoat-forming material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-12-04 US disclosed