Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15163465 | 0.85 | — | — | |
| SCHEMBL30400932 | 0.79 | ALDH1A1 (0.37) | ALDH1A1L3MBTL1 | |
| SCHEMBL14649511 | 0.79 | ALDH1A1 (0.32) | ALDH1A1L3MBTL1 | |
| SCHEMBL6129888 | 0.78 | ALDH1A1 (0.38) | ALDH1A1L3MBTL1 | |
| SCHEMBL6129790 | 0.77 | CA1 (0.38) | ALDH1A1L3MBTL1 | |
| SCHEMBL14228106 | 0.77 | ALDH1A1 (0.31) | ALDH1A1L3MBTL1 | |
| SCHEMBL22869222 | 0.77 | — | — | |
| SCHEMBL8198277 | 0.77 | — | — | |
| SCHEMBL15858318 | 0.76 | ALDH1A1 (0.33) | ALDH1A1L3MBTL1 | |
| SCHEMBL13464683 | 0.76 | ALDH1A1 (0.30) | ALDH1A1L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230338903-A1 | LAMINATE | DAICEL CORPORATION (JP) | 2023-10-26 | — | — | US | disclosed |
| US-7914965-B2 | Resist composition and method of pattern formation with the same | FUJIFILM CORPORATION (JP) | 2011-03-29 | — | — | US | disclosed |
| US-20080318108-A1 | Solid Electrolyte, Membrane and Electrode Assembly, and Fuel Cell | FUJIFILM CORPORATION | 2008-12-25 | — | — | US | disclosed |
| US-7235343-B2 | Photoacid generators, chemically amplified resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-06-26 | — | — | US | disclosed |
| US-20040229162-A1 | Photoacid generators, chemically amplified resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-11-18 | — | — | US | disclosed |