⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ether SCHEMBL5430911 | 0.88 | — | — | |
| SCHEMBL14590952 | 0.72 | — | — | |
| SCHEMBL23248753 | 0.68 | — | — | |
| SCHEMBL6203953 | 0.66 | — | — | |
| SCHEMBL13602734 | 0.64 | CES1 (0.32) | — | |
| SCHEMBL92813 | 0.63 | LMNA (0.34) | — | |
| SCHEMBL9969468 | 0.61 | — | — | |
| SCHEMBL18597381 | 0.61 | — | — | |
| SCHEMBL15402829 | 0.59 | — | — | |
| SCHEMBL31117232 | 0.58 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7169531-B2 | Photoresist suitable for use in 157 nm photolithography and including a polymer based on fluorinated norbornene derivatives | INFINEON TECHNOLOGIES, AG (DE) | 2007-01-30 | — | — | US | disclosed |
| US-20050170279-A1 | Photoresist suitable for use in 157 nm photolithography and including a polymer based on fluorinated norbornene derivatives | INFINEON TECHNOLOGIES AG (DE) | 2005-08-04 | — | — | US | disclosed |