SCHEMBL5370727

SCHEMBL5370727

C=C[Si](C)(C)O[SiH](C)O[Si](C)(C)C=C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16259345 0.86
SCHEMBL335478 0.82
SCHEMBL4151530 0.80
SCHEMBL4734725 0.79
SCHEMBL13933658 0.78
SCHEMBL17407625 0.78
SCHEMBL4269822 0.78
SCHEMBL7031150 0.76
SCHEMBL28303867 0.74
SCHEMBL18252748 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116867464-A Composite optically tunable intraocular lens with diffractive structure RX视觉股份有限公司 2023-10-10 CN disclosed
CN-115397365-A Composite light adjustable intraocular lens with adhesion promoter RX视觉股份有限公司 2022-11-25 CN disclosed
US-10941253-B2 Block copolymer, and method of producing structure containing phase-separated structure TOKYO OHKA KOGYO CO., LTD. (JP) 2021-03-09 US disclosed
US-20180244856-A1 BLOCK COPOLYMER, AND METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE TOKYO INSTITUTE OF TECHNOLOGY (JP) 2018-08-30 US disclosed
JP-2007302721-A SILOXANE DERIVATIVE AND SILOXANE DERIVATIVE-COATING INORGANIC OXIDE TOKYO INSTITUTE OF TECHNOLOGY 2007-11-22 JP disclosed
JP-2006056923-A INK FOR INK-JET RECORDING TOKYO INSTITUTE OF TECHNOLOGY 2006-03-02 JP disclosed
JP-2005307196-A SILOXANE DERIVATIVE AND PRODUCTION METHOD THEREOF RIKOGAKU SHINKOKAI 2005-11-04 JP disclosed