SCHEMBL5370754

SCHEMBL5370754

C/C=C/C(=O)OC(CCCC)N=C=O

nearest known ligand 0.33

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
ATM Q13315 1/20 0.33
TSHR P16473 1/20 0.32
CTSK P43235 3/20 0.31
ACHE P22303 1/20 0.30
BACE1 P56817 1/20 0.30
CA1 P00915 1/20 0.30
CA2 P00918 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5370761 1.00 ATM (0.33) ATMTSHRCTSKACHEBACE1
SCHEMBL5356473 0.95 MAPT (0.33) ATMCA1
SCHEMBL5356468 0.95 MAPT (0.33) ATMCA1
SCHEMBL3695161 0.91
SCHEMBL3695168 0.91
SCHEMBL5354170 0.84
SCHEMBL5354164 0.84
SCHEMBL4672306 0.83 TSHR (0.45) ATMTSHRCTSKCA1CA2
SCHEMBL5354708 0.79 TSHR (0.41) TSHRCA1
SCHEMBL9584947 0.78 TSHR (0.40) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7282323-B2 Highly heat-resistant, negative-type photosensitive resin composition ASAHI KASEI EMD CORPORATION (JP) 2007-10-16 US disclosed
US-20050244739-A1 Highly heat-resistant, negative-type photosensitive resin composition ASAHI KASEI EMD CORPORATION (JP) 2005-11-03 US disclosed
EP-1536286-A1 HIGHLY HEAT-RESISTANT, NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION Asahi Kasei EMD Corporation (JP) 2005-06-01 EP disclosed