Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | SMPD1 | P17405 | 3/20 | 0.32 |
| ▸ | ATM | Q13315 | 1/20 | 0.32 |
| ▸ | HCAR2 | Q8TDS4 | 2/20 | 0.31 |
| ▸ | ZDHHC7 | Q9NXF8 | 1/20 | 0.31 |
| ▸ | GPR84 | Q9NQS5 | 3/20 | 0.31 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.31 |
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
| ▸ | FAAH | O00519 | 1/20 | 0.31 |
| ▸ | GRIK1 | P39086 | 1/20 | 0.30 |
| ▸ | SLC1A2 | P43004 | 1/20 | 0.30 |
| ▸ | SLC1A1 | P43005 | 1/20 | 0.30 |
| ▸ | GRIK2 | Q13002 | 1/20 | 0.30 |
| ▸ | TP53 | P04637 | 1/20 | 0.30 |
| ▸ | LAP3 | P28838 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5356473 | 1.00 | MAPT (0.33) | MAPTSMPD1ATMHCAR2ZDHHC7 | |
| SCHEMBL5370754 | 0.95 | ATM (0.33) | ATMCA1 | |
| SCHEMBL5370761 | 0.95 | ATM (0.33) | ATMCA1 | |
| SCHEMBL3695168 | 0.89 | — | — | |
| SCHEMBL3695161 | 0.89 | — | — | |
| SCHEMBL5354708 | 0.84 | TSHR (0.41) | MAPTZDHHC7GPR84FFAR1CA1 | |
| SCHEMBL5354170 | 0.83 | — | — | |
| SCHEMBL5354164 | 0.83 | — | — | |
| SCHEMBL5358881 | 0.82 | TSHR (0.40) | MAPTZDHHC7GPR84FFAR1FAAH | |
| SCHEMBL17377701 | 0.82 | TSHR (0.40) | MAPTZDHHC7GPR84FFAR1FAAH |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7282323-B2 | Highly heat-resistant, negative-type photosensitive resin composition | ASAHI KASEI EMD CORPORATION (JP) | 2007-10-16 | — | — | US | disclosed |
| US-20050244739-A1 | Highly heat-resistant, negative-type photosensitive resin composition | ASAHI KASEI EMD CORPORATION (JP) | 2005-11-03 | — | — | US | disclosed |
| EP-1536286-A1 | HIGHLY HEAT-RESISTANT, NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION | Asahi Kasei EMD Corporation (JP) | 2005-06-01 | — | — | EP | disclosed |
| US-5847071-A | Photosensitive resin composition | HITACHI, CHEMICAL CO., LTD. (JP) | 1998-12-08 | — | — | US | disclosed |
| US-5668248-A | POLYAMIC ACID ESTERS | HITACHI CHEMICAL CO., LTD. (JP) | 1997-09-16 | — | — | US | disclosed |
| US-5472823-A | Polyamic acids | HITACHI CHEMICAL CO., LTD. (JP) | 1995-12-05 | — | — | US | disclosed |
| EP-0373952-B1 | Photosensitive resin composition and photosensitive element using the same | HITACHI CHEMICAL CO LTD (JP) | 1995-02-08 | — | — | EP | disclosed |
| US-5262277-A | Light sensitive elements for electrical thick films with heat resistance | HITACHI CHEMICAL COMPANY, INC. (JP) | 1993-11-16 | — | — | US | disclosed |
| EP-0373952-A2 | Photosensitive resin composition and photosensitive element using the same | Hitachi Chemical Co., Ltd. (JP) | 1990-06-20 | — | — | EP | disclosed |