SCHEMBL5371502

SCHEMBL5371502

C=C(C)C(=O)OC(O)COCCO

nearest known ligand 0.40

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.40
THRB P10828 1/20 0.38
ALDH1A1 P00352 2/20 0.34
MAPK1 P28482 1/20 0.31
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6048437 0.97 THRB (0.40) TSHRTHRBALDH1A1MAPK1MEN1
SCHEMBL16209800 0.83 THRB (0.56) TSHRTHRBALDH1A1MEN1KMT2A
Methacrylic Acid SCHEMBL9421574 0.83 TSHR (0.31) TSHR
SCHEMBL5984326 0.82 TSHR (0.44) TSHRTHRBALDH1A1MAPK1MEN1
SCHEMBL28180557 0.81 THRB (0.48) TSHRTHRBALDH1A1
Methacrylic Acid SCHEMBL10390573 0.80 MEN1 (0.34) TSHRTHRBMAPK1MEN1KMT2A
Methacrylic Acid SCHEMBL9421554 0.80 MEN1 (0.34) TSHRTHRBMAPK1MEN1KMT2A
Methacrylic Acid SCHEMBL9421586 0.80 MEN1 (0.34) TSHRTHRBMAPK1MEN1KMT2A
SCHEMBL2131634 0.79 THRB (0.40) TSHRTHRBALDH1A1MEN1KMT2A
SCHEMBL9421569 0.79 TSHR (0.38) TSHRTHRBALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7026371-B2 Electron beam curable urethane resin for magnetic recording medium, method of manufacturing the same, and magnetic recording medium using the same TDK CORPORATION (JP) 2006-04-11 US claimed
US-7201978-B2 Magnetic recording medium TDK CORPORATION (JP) 2007-04-10 US disclosed
US-20060115687-A1 Electron beam curable urethane resin for magnetic recording medium, method of manufacturing the same and magnetic recording medium using the same TDK CORPORATION (JP) 2006-06-01 US disclosed
US-7026371-B2 Electron beam curable urethane resin for magnetic recording medium, method of manufacturing the same, and magnetic recording medium using the same TDK CORPORATION (JP) 2006-04-11 US disclosed
US-7001955-B2 Electron beam curing resin for magnetic recording medium, method for manufacturing the same, and magnetic recording medium including the same TDK CORPORATION (JP) 2006-02-21 US disclosed
US-20050118459-A1 Magnetic recording medium TDK CORPORATION (JP) 2005-06-02 US disclosed
US-20040241453-A1 Electron beam curing resin for magnetic recording medium, method for manufacturing the same, and magnetic recording medium including the same TDK CORPORATION (JP) 2004-12-02 US disclosed
US-20040241497-A1 Electron beam curing resin for magnetic recording medium, method for manufacturing the same, and magnetic recording medium including the same TDK CORPORATION (JP) 2004-12-02 US disclosed
US-20040034165-A1 Electron beam curable urethane resin for magnetic recording medium, method of manufacturing the same, and magnetic recording medium using the same TDK CORPORATION (JP) 2004-02-19 US disclosed
US-6164785-A Antiglaring film DAI NIPPON PRINTING CO., LTD. (JP) 2000-12-26 US disclosed