Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.63 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.63 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.43 |
| ▸ | CA12 | O43570 | 2/20 | 0.42 |
| ▸ | CA1 | P00915 | 2/20 | 0.42 |
| ▸ | CA2 | P00918 | 2/20 | 0.42 |
| ▸ | CA9 | Q16790 | 2/20 | 0.42 |
| ▸ | CA6 | P23280 | 1/20 | 0.42 |
| ▸ | RNASEH1 | O60930 | 1/20 | 0.40 |
| ▸ | PTPN11 | Q06124 | 1/20 | 0.40 |
| ▸ | GPR35 | Q9HC97 | 1/20 | 0.40 |
| ▸ | ATG4B | Q9Y4P1 | 1/20 | 0.40 |
| ▸ | MGAM | O43451 | 1/20 | 0.40 |
| ▸ | CA7 | P43166 | 1/20 | 0.39 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.39 |
| ▸ | PSMD14 | O00487 | 1/20 | 0.38 |
| ▸ | PKM | P14618 | 1/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 2/20 | 0.37 |
| ▸ | DAO | P14920 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5372977 | 0.84 | KMT2A (0.43) | MEN1KMT2AHPGD | |
| Hydrochloric Acid SCHEMBL8499722 | 0.82 | PARP1 (0.43) | MEN1KMT2APTPN11PSMD14L3MBTL1 | |
| SCHEMBL20744936 | 0.80 | MEN1 (0.49) | MEN1KMT2APTPN1CA12CA1 | |
| SCHEMBL8766190 | 0.80 | CA12 (0.46) | MEN1KMT2ACA12CA1CA2 | |
| SCHEMBL1901737 | 0.78 | MEN1 (1.00) | MEN1KMT2APTPN1CA12CA1 | |
| SCHEMBL2474711 | 0.77 | MEN1 (0.53) | MEN1KMT2APTPN1CA12CA1 | |
| SCHEMBL23292914 | 0.76 | MEN1 (0.40) | MEN1KMT2A | |
| SCHEMBL9239387 | 0.75 | MEN1 (0.50) | MEN1KMT2APTPN1CA12CA1 | |
| SCHEMBL10012128 | 0.73 | MEN1 (0.68) | MEN1KMT2APTPN1CA12CA1 | |
| SCHEMBL1403567 | 0.73 | MEN1 (0.82) | MEN1KMT2ACA12CA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 137 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3067897-B1 | CONDUCTIVE MATERIAL AND SUBSTRATE | SHINETSU CHEMICAL CO (JP) | 2020-05-27 | — | — | EP | disclosed |
| EP-3153553-B1 | CONDUCTIVE POLYMER COMPOSITION, COATED ARTICLE, AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2019-05-01 | — | — | EP | disclosed |
| EP-2947126-B1 | CONDUCTIVE POLYMER COMPOSITE AND SUBSTRATE | SHINETSU CHEMICAL CO (JP) | 2019-02-13 | — | — | EP | disclosed |
| US-10023752-B2 | Conductive material and substrate | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-07-17 | — | — | US | disclosed |
| US-10020089-B2 | Conductive polymer composite and substrate | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-07-10 | — | — | US | disclosed |
| US-9991019-B2 | Conductive polymer composite and substrate | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-06-05 | — | — | US | disclosed |
| US-20180134860-A1 | STRETCHABLE FILM, METHOD FOR FORMING THE SAME, STRETCHABLE WIRING FILM, AND METHOD FOR MANUFACTURING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-05-17 | — | — | US | disclosed |
| US-9922747-B2 | Conductive material and substrate | SHIN-ETSU HANDOTAI CO., LTD. (JP) | 2018-03-20 | — | — | US | disclosed |
| US-9916916-B2 | Conductive material and substrate | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-03-13 | — | — | US | disclosed |
| US-9897917-B2 | Conductive polymer composition, coated article, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-02-20 | — | — | US | disclosed |
| US-20100159392-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-06-24 | — | — | US | disclosed |
| CN-101541811-A | Pyrazolopyrimidine Derivatives | DAIICHI SANKYO CO LTD (JP) | 2009-09-23 | — | — | CN | disclosed |
| US-20070248911-A1 | Pattern forming method and bilayer film | IWASAWA HARUO | 2007-10-25 | — | — | US | disclosed |
| US-7244549-B2 | Pattern forming method and bilayer film | JSR CORPORATION (JP) | 2007-07-17 | — | — | US | disclosed |
| US-6852791-B2 | Anti-reflection coating forming composition | JSR CORPORATION (JP) | 2005-02-08 | — | — | US | disclosed |
| EP-1205805-B1 | Anti-reflection coating forming composition | JSR CORP (JP) | 2004-09-15 | — | — | EP | disclosed |
| US-20030073040-A1 | Pattern forming method and bilayer film | JSR CORPORATION (JP) | 2003-04-17 | — | — | US | disclosed |
| US-20020086934-A1 | Anti-reflection coating forming composition | JSR CORPORATION (JP) | 2002-07-04 | — | — | US | disclosed |
| EP-1205805-A1 | Anti-reflection coating forming composition | JSR Corporation (JP) | 2002-05-15 | — | — | EP | disclosed |
| US-4816519-A | VULCANIZABLE RUBBER BLEND, MOLDING MATERIALS | NIPPON ZEON CO., LTD. (JP) | 1989-03-28 | — | — | US | disclosed |