Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 4/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.30 |
| ▸ | TP53 | P04637 | 2/20 | 0.30 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.30 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.30 |
| ▸ | NAMPT | P43490 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9275566 | 0.85 | TSHR (0.41) | TDP1TSHRTHRBALDH1A1TP53 | |
| SCHEMBL2963385 | 0.81 | GAA (0.46) | TDP1TSHRTHRBALDH1A1HSD17B10 | |
| SCHEMBL4854022 | 0.80 | — | — | |
| SCHEMBL4849311 | 0.79 | GAA (0.44) | TDP1TSHRTHRBALDH1A1HSD17B10 | |
| SCHEMBL21934059 | 0.79 | TDP1 (0.36) | TDP1TSHRALDH1A1NAMPT | |
| SCHEMBL3265777 | 0.79 | TDP1 (0.36) | TDP1TSHRALDH1A1NAMPT | |
| SCHEMBL5359530 | 0.79 | GAA (0.44) | TDP1TSHRTHRBALDH1A1HSD17B10 | |
| SCHEMBL7647466 | 0.79 | NAAA (0.36) | TDP1TSHRALDH1A1NAMPT | |
| SCHEMBL2965176 | 0.79 | GAA (0.44) | TDP1TSHRTHRBALDH1A1HSD17B10 | |
| SCHEMBL12967099 | 0.79 | GAA (0.44) | TDP1TSHRTHRBALDH1A1HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7179581-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| US-20040234885-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-11-25 | — | — | US | disclosed |