SCHEMBL5377576

SCHEMBL5377576

COCCOCCOCCOCCOCCCl

nearest known ligand 0.37

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
CA2 P00918 1/20 0.37
ALDH1A1 P00352 2/20 0.35
TP53 P04637 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5376990 1.00 CA2 (0.37) CA2ALDH1A1TP53
SCHEMBL668124 1.00 CA2 (0.37) CA2ALDH1A1TP53
SCHEMBL975869 1.00
SCHEMBL3208711 1.00 CA2 (0.37) CA2ALDH1A1TP53
SCHEMBL16106544 1.00 CA2 (0.37) CA2ALDH1A1TP53
SCHEMBL25220010 1.00 CA2 (0.37) CA2ALDH1A1TP53
Methylene Chloride SCHEMBL28083718 0.87 CA2 (0.39) CA2
Methylene Chloride SCHEMBL28142452 0.87 CA2 (0.39) CA2
Methylene Chloride SCHEMBL28327323 0.87 CA2 (0.39) CA2
Methylene Chloride SCHEMBL22664710 0.87 CA2 (0.39) CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7252925-B2 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-08-07 US disclosed
US-20050095533-A1 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2005-05-05 US disclosed