Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16341453 | 0.91 | — | — | |
| SCHEMBL16341194 | 0.89 | TSHR (0.39) | — | |
| SCHEMBL16341271 | 0.85 | — | — | |
| SCHEMBL27576730 | 0.83 | — | — | |
| SCHEMBL11234258 | 0.81 | TSHR (0.42) | — | |
| SCHEMBL2124615 | 0.80 | HSD17B10 (0.32) | HSD17B10 | |
| SCHEMBL74895 | 0.80 | — | — | |
| SCHEMBL25388028 | 0.78 | HSD17B10 (0.31) | HSD17B10 | |
| Rubidium SCHEMBL4809347 | 0.78 | — | — | |
| SCHEMBL7692444 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4338133-A | Jet printing ink composition | DAI NIPPON TORYO CO., LTD. (JP) | 1982-07-06 | — | — | US | claimed |
| US-7205085-B2 | Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern | JSR CORPORATION (JP) | 2007-04-17 | — | — | US | disclosed |
| US-7125647-B2 | Radiation-sensitive composition changing in refractive index and utilization thereof | JSR CORPORATION (JP) | 2006-10-24 | — | — | US | disclosed |
| EP-1413924-A1 | COMPOSITION HAVING PERMITIVITY BEING RADIATION-SENSITIVELY CHANGEABLE AND METHOD FOR FORMING PERMITIVITY PATTERN | JSR Corporation (JP) | 2004-04-28 | — | — | EP | disclosed |
| US-20040005506-A1 | Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern | JSR CORPORATION (JP) | 2004-01-08 | — | — | US | disclosed |
| EP-1375597-A1 | RADIATION-SENSITIVE COMPOSITION CHANGING IN REFRACTIVE INDEX AND UTILIZATION THEREOF | JSR Corporation (JP) | 2004-01-02 | — | — | EP | disclosed |
| US-20030171468-A1 | Radiation-sensitive composition changing in refractive index and utilization thereof | JSR CORPORATION (JP) | 2003-09-11 | — | — | US | disclosed |
| US-5094917-A | Chemical resistant coatings | ISP INVESTMENTS INC. (US) | 1992-03-10 | — | — | US | disclosed |
| US-5039716-A | Cross-linking agent; chemical resistant coatings, nontoxic | GAF CHEMICALS CORPORATION (US) | 1991-08-13 | — | — | US | disclosed |
| WO-1991011467-A1 | ALKENYL ETHERS AND RADIATION CURABLE COMPOSITIONS | ISP INVESTMENTS INC. (US) | 1991-08-08 | — | — | WO | disclosed |
| US-4338133-A | Jet printing ink composition | DAI NIPPON TORYO CO., LTD. (JP) | 1982-07-06 | — | — | US | disclosed |
| US-4107140-A | Production of the reaction products of oxidated silicon compounds reacting with organic monohydroxy compounds | BLOUNT DAVID H | 1978-08-15 | — | — | US | disclosed |