SCHEMBL7692444

SCHEMBL7692444

CCCO[Si](C)(C)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14777016 0.82
SCHEMBL27880908 0.78 THRB (0.43)
SCHEMBL5397928 0.78 HSD17B10 (0.32)
SCHEMBL2124615 0.78 HSD17B10 (0.32)
SCHEMBL74895 0.78
SCHEMBL25388028 0.75 HSD17B10 (0.31)
SCHEMBL16083903 0.75
SCHEMBL4810651 0.75
SCHEMBL4811732 0.75
Rubidium SCHEMBL4809347 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116615245-A Composition comprising a lipophilic compound and one or more (bio) alkanediols 西姆莱斯股份公司 2023-08-18 CN disclosed
CN-116568267-A Compositions comprising (bio) -alkanediol and cooling agent 西姆莱斯股份公司 2023-08-08 CN disclosed
CN-116528824-A Composition comprising an ultraviolet filter and one or more (bio) -alkanediols 西姆莱斯股份公司 2023-08-01 CN disclosed
US-8507095-B2 Metal oxide-based fine particle and method for manufacturing the same, and resin composition NEC CORPORATION (JP) 2013-08-13 US disclosed
US-8329849-B2 Organic silicon compound and material for forming silica-based fine particle NEC CORPORATION (JP) 2012-12-11 US disclosed
US-20110061567-A1 METAL OXIDE-BASED FINE PARTICLE AND METHOD FOR MANUFACTURING THE SAME, AND RESIN COMPOSITION NEC CORPORATION (JP) 2011-03-17 US disclosed
US-20110065881-A1 ORGANIC SILICON COMPOUND AND MATERIAL FOR FORMING SILICA-BASED FINE PARTICLE NEC CORPORATION (JP) 2011-03-17 US disclosed
US-6344579-B1 REACTION OF FLUOROSILICON COMPOUND WITH REACTION OF SILICON WITH HYDROXY, ALKOXY OR ARYLOXY GROUP WITH DIFLUORODIAMINO COMPOUND MITSUI CHEMICALS, INC. (JP) 2002-02-05 US disclosed
EP-1138633-A1 PROCESS FOR PRODUCING FLUORINATED SILICON COMPOUND Mitsui Chemicals, Inc. (JP) 2001-10-04 EP disclosed