⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5412411 | 0.94 | — | — | |
| SCHEMBL8433547 | 0.92 | — | — | |
| SCHEMBL5406775 | 0.79 | — | — | |
| SCHEMBL5002878 | 0.78 | ALDH1A1 (0.31) | — | |
| SCHEMBL5412034 | 0.73 | — | — | |
| SCHEMBL2369826 | 0.72 | — | — | |
| SCHEMBL11569552 | 0.70 | — | — | |
| SCHEMBL1053137 | 0.67 | — | — | |
| SCHEMBL21197797 | 0.67 | — | — | |
| SCHEMBL5412417 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0539901-B1 | Process for producing thermoplastic resin | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1996-02-28 | — | — | EP | claimed |
| EP-0539901-A1 | Process for producing thermoplastic resin | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1993-05-05 | — | — | EP | claimed |
| US-7291567-B2 | Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2007-11-06 | — | — | US | disclosed |
| US-20060024980-A1 | Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2006-02-02 | — | — | US | disclosed |
| EP-1619226-A1 | Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR Corporation (JP) | 2006-01-25 | — | — | EP | disclosed |
| EP-0539901-B1 | Process for producing thermoplastic resin | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1996-02-28 | — | — | EP | disclosed |
| US-5274053-A | Grafting a vinyl monomer to a modified polyorganosiloxane and crosslinking with an alkoxysilane having an azo or disulfide group | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1993-12-28 | — | — | US | disclosed |
| EP-0539901-A1 | Process for producing thermoplastic resin | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1993-05-05 | — | — | EP | disclosed |